Monte Carlo Feature Profile Model (MCFPM)

  Robert J. Hoekstra and Mark J. Kushner


The Monte Carlo Feature Profile Model (MCFPM) is an offline module used by the Hybrid Plasma Equipment Model (HPEM). The resulting flux distributions produced by the Plasma Chemistry Monte Carlo Model (PCMCM) are utilized to determine the evolution of etch features in plasma etching reactors. The MCFPM takes the following inputs to generate etch profiles.

There are both 2D and 3D versions of the code. Below is an example of 3D etched feature in polysilicon.


The 2D version of the MCFPM allows for speculare reflection of high energy ions at the sidewalls of the etch profile. The effect can be seen in the microtrench formation in the corners of the feature below.