Plasma Chemistry Monte Carlo Model (PCMCM)

  Robert J. Hoekstra and Mark J. Kushner


The Plasma Chemistry Monte Carlo Model (PCMCM) is an offline extension of the Hybrid Plasma Equipment Model (HPEM). Using Monte Carlo numerical methods, the PCMCM uses input from the HPEM as well as input data files:

Below is an example of the species densities distributions produced by the HPEM.


The PCMCM produces energy and angular distributions for ion and neutral species at any surface location in the reactor. Examples of distributions for a Chlorine based etch chemistry in an Inductively Coupled Reactor are shown below.


These distributions can be used by the Monte Carlo Feature Profile Model (MCFPM) to determine the time evolution of etch features at any location on the substrate.