This page contains links to current and past projects by the Computational Plasma Science and Engineering Group.

• Plasma Etching of HfO₂ Gate Stacks with Si Selectivity [New! Juline Shoeb (12 June 2009)]

• Branching and Structure of Streamers in Gases, Liquids and Gaseous Bubbles Immersed in Liquids [New! Natalie Babaeva (12 June 2009)]

• Penetration of Plasma Into the Wafer-Focus Ring Gap in Capacitively Coupled Plasmas [New! Natalie Babaeva (12 June 2009)]

• Numerical Investigation of Wave Effects in High Frequency Capacitively Coupled Plasmas [New! Yang Yang (21 February 2009)]

• Elimination of Twisting in High Aspect Ratio (HAR) SiO₂ Etching in Fluorocarbon Plasmas - High Energy Electron (HEE) Effects [New! Mingmei Wang (21 February 2009)]

• 2-dimensional Modeling of Pulsed Inductively Coupled Plasmas [Pramod Subramonium (26 August 2003)]

• Non-equilibrium Ion and Neutral Transport in Low-pressure Plasma Processing Reactors [
• Coulomb Crystals in Plasma Processing Reactors [Vivek Vyas (26 August 2003)]

• Global Modeling of Singlet-Delta Oxygen Production in Glow Discharges with Application to Oxygen-Iodine Lasers [D. Shane Stafford (26 August 2003)]

• Startup Processes in Metal Halide Lamps [Ananth Bhoj (26 August 2003)]

• Radiation Trapping in Electrodeless Lamps [Kapil Rajaraman (26 August 2003)]

• Harmonic Content of Electron Impact Source Functions in Inductively Coupled Plasmas using an "On-the-Fly" Monte Carlo Technique [Arvind Sankaran (26 August 2003)]

• Integrated Modeling: Etching and Post-processing of Porous and Conventional SiO₂ in Fluorocarbon Plasmas [Arvind Sankaran (26 August 2003)]

• Hybrid Plasma Equipment Model: Inductively Coupled Plasma Etching Reactors

• Consequences of Asymmetric Pumping in an ICP Reactor

• Plasma Chemistry Monte Carlo Module

• Monte Carlo Feature Profile Model

• Studies in Nonlinear Plasma-Circuit Interaction

• Feedback Control of RF Plasma Processing Reactors (Updated 9/30/98)

• A Plasma Display Panel Simulation Code (Updated 9/30/98)

• Simulations of Remote AR/O₂ and AR/N₂ Plasmas for Oxide Growth and Interface Treatments

• Studies of Electron Cyclotron Resonance (ECR) Devices Sustained by Azimuthal Microwave TE(0,n) Mode Fields

• Magnetron Ionized Metal Physical Vapor Deposition

• Plasma Remediation of Greenhouse Gases in Semiconductor Processing

• Plasma Remediation of Toxic Gases in DBDs

• Plasma Transport Around Complex Dust Agglomerates

• Simulation of PECVD of SiO₂ Film on Plastic Tubes

• Surface Reaction Modeling in Plasma Deposition and Etching Processing

• 3-Dimensional Plasma Equipment Simulation Using a New Ambipolar Accleration Technique