The following is a list of publications produced by the CODP group starting in 1978. To request reprints:

1. Note the number(s) of the paper(s) you want a reprint of.
2. Scroll to the bottom of this page.
3. Send e-mail to Prof. Kushner, including your name, address and the number(s) from the listing of the reprint(s) you want.

Some of the recent articles can be downloaded in PDF format. To download the article, click on the highlighted text. You can obtain the Acrobat Reader for PDF files from .

1. M. J. Kushner and F. E. C. Culick, "Extrema of Electron Density and Output Pulse Energy in a CuCl/Ne Discharge and a Cu/CuCl Double Pulsed Laser " , Appl. Phys. Lett. 33, 728 (1978).
2. M. J. Kushner and F. E. C. Culick, "A Continuous Discharge Improves the Performance of the Cu/CuCl Double Pulsed Laser", IEEE J. Quant. Elect. QE-15, 835 (1979).
3. M. J. Kushner and F. E. C. Culick, " Characteristics of the Pumping Pulse and the Output Laser Pulse of a Cu/CuCl Double Pulsed Laser ", J. Quant. Elect. QE-16, 677 (1980).
4. M. J. Kushner and F. E. C. Culick, " A Model for the Dissociation Pulse, Afterglow, and Laser Pulse in the Cu/CuCl Double Pulsed Laser ", J. Appl. Phys. 51, 3020 (1980).
5. M. J. Kushner, " Characteristics of a UF6-H2/HF Nuclear Pumped Laser ", J. Appl. Phys. 51, 2421 (1980).
6. M. J. Kushner, W. M. Grossman and F. E. C. Culick, " Electron Collision Quenching of CO(v) Chemiluminescence in CS2/O2 and CS2/O2/N2O Flames " , J. Appl. Phys. 52, 3776 (1981).
7. M. J. Kushner, " A Self-Consistent Model for High Repetition Rate Copper Vapor Lasers ", J. Quant. Elect. QE-17, 1555 (1981).
8. M. J. Kushner, " A Kinetic Study of the Plasma Etching Process I: A Model for the Etching of Si and SiO2 in CnFm/H2 and CnFm/O2 Plasmas ", J. Appl. Phys. 53, 2923 (1982). (ERRATA: J. Appl. Phys. 53, 6491 (1982)).
9. M. J. Kushner, " A Kinetic Study of the Plasma Etching Process II: Probe Measurements of Electron Properties in an RF Plasma Etching Reactor ", J. Appl. Phys. 53, 2939 (1982).
10. P. J. Hargis and M. J. Kushner, " Detection of CF2 Radicals in a Plasma Etching Reactor by KrF Laser-Induced-Fluorescence " , Appl. Phys. Lett. 40, 779 (1982).
11. M. J. Kushner, " Probability Distributions for the Breakdown Voltage Between Closely Spaced Electrodes on Insulated Surfaces " , J. Appl. Phys. 53, 6731 (1982).
12. M. J. Kushner, " A Nuclear-Reactor Pumped Laser Excited by Ion-Ion Neutralization ", J. Appl. Phys. 54, 39 (1983).
13. W. G. Breiland and M. J. Kushner, " Pulsed UV Laser Raman Spectroscopy of Silane in a Linear-Flow Chemical Vapor Deposition Reactor " , Appl. Phys. Lett. 42, 395 (1983).
14. M. J. Kushner and B. E. Warner, "Large Bore Copper Vapor Lasers: Kinetics and Scaling Issues " , J. Appl. Phys. 54, 2970 (1983).
15. M. J. Kushner, "Optogalvanic Isotope Enrichment of Copper Ions in Cu-Ne Positive Column Discharges", Appl. Opt. 22, 1970 (1983).
16. M. J. Kushner, " A Monte-Carlo Simulation of Electron Properties in Parallel Plate Capacitively Coupled RF Discharges " J. Appl. Phys. 54, 4958 (1983).
17. M. J. Kushner, " Floating Sheath Potentials in Non-Maxwellian Plasmas, " IEEE Trans. Plasma Sci. PS-13, 6 (1985).
18. M. J. Kushner, "Arc Expansion in Xenon Flashlamps," J. Appl. Phys. 57, 2486 (1985).
19. M. J. Kushner, A. L. Pindroh, C. H. Fisher, T. A. Znotins and J. J.Ewing, "Multidimensional Modeling of Transverse Avalanche Laser Discharges: Applications to the HgBr Laser," J. Appl. Phys. 57, 2406 (1985).
20. M. J. Kushner, W. D. Kimura and S. R. Byron, "Arc Resistance of Laser Triggered Spark Gaps," J. Appl. Phys. 58, 1744 (1985).
21. M. J. Kushner, R. D. Milroy and W. D. Kimura, "A Laser Triggered Spark Gap Model," J. Appl. Phys. 58, 2988 (1985).
22. D. Barrett, W. D. Kimura, M. J. Kushner, E. A. Crawford and S. R. Byron, "Low Inductance Capacitive Probe for Spark Gap Voltage Measurements," Rev. Sci. Instrum. 56, 2111 (1985).
23. M. J. Kushner, W. D. Kimura, D. H. Ford and S. R. Byron, "Dual Arc Formation in a Laser Triggered Spark Gap," J. Appl. Phys. 58, 4015 (1985).
24. M. J. Kushner, "Distribution of Ion Energies on Electrodes in Capacitively Coupled RF Discharges," J. Appl. Phys. 58, 4024 (1985).
25. F. J. Kampas and M. J. Kushner, " Effect of Silane Pressure on Silane-Hydrogen RF Glow Discharges, " IEEE Trans. Plasma Sci. PS-14, 173 (1986).
26. M. J. Kushner, " Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges, " IEEE Trans. Plasma Sci. PS-14, 188 (1986).
27. W. D. Kimura, M. J. Kushner, E. A. Crawford and S. R. Byron, " Laser Interferometric Measurements of a Laser Preionization Triggered Spark Column, " IEEE Trans. Plasma Sci. PS-14, 246 (1986).
28. C. H. Fisher, J. J. Ewing, T. E. Dehart, M. J. Kushner and J. McDaniels, "High Efficiency XeCl Laser Excitation with Magnetic Switching," Appl. Phys. Lett. 48, 1574 (1986).
29. M. J. Kushner and A. L. Pindroh, "Discharge Constriction, Photodetachment, and Ionization Instabilities in E-Beam Sustained Discharge Excimer Lasers," J. Appl. Phys. 60, 904 (1986).
30. M. J. Kushner, C. H. Fisher, J. Demboski, and R. A. Petr, "Performance of and Excited State Densities in a Linear Thyratron," J. Appl. Phys. 60, 2766 (1986).
31. D. B. Harris, M. J. Kushner and others, "Future Developments and Applications of KrF Laser Fusion Systems," Fusion Technology 11, 705 (1987).
32. M. J. Kushner, "Application of a Particle Simulation to Modeling Commutation in a Linear Thyratron," J. Appl. Phys. 61, 2784 (1987).
33. J. M. Eggleston and M. J. Kushner, "Stimulated Brillouin Scattering Parasitics in Large Optical Windows," Optics Lett. 12, 410 (1987).
34. M. J. Kushner, "Discharge Instabilities Initiated by Nonuniform Laser Extraction in E-Beam Sustained Discharge KrF Lasers," J. Appl. Phys. 62, 101 (1987).
35. G. Hebner and M. J. Kushner, "The Phase and Energy Distribution of Ions Incident on Electrodes in Radio Frequency Discharges," J. Appl. Phys. 62, 2256 (1987).
36. M. J. Kushner, "On the Balance Between Silyl and Silylene Radicals in RF Glow Discharges in Silane: The Effect on Deposition Rates of a-Si:H," J. Appl. Phys. 62, 2803 (1987).
37. M. J. Kushner, "A Phenomenological Model for the Surface Deposition Kinetics During Plasma and Sputter Deposition of Amorphous Silicon," J. Appl. Phys. 62, 4763, (1987).
38. G. A. Hebner, J. T. Verdeyen, and M. J. Kushner, "An Experimental Study of a Parallel Plate Radio Frequency Discharge: Measurements of the Radiation Temperature and Electron Density", J. Appl. Phys. 63, 2226 (1988).
39. W. D. Kimura, M. J. Kushner, and J. Seamans, "Characteristics of a Laser Triggered Spark Gap Using Air, Ar, CH4, H2, He, N2, SF6, and Xe", J. Appl. Phys. 63, 1882 (1988).
40. T. J. Moratz and M. J. Kushner, "Fission Fragment Pumping of a Neon Plasma", J. Appl. Phys. 63, 1796 (1988).
41. M. J. Kushner, "A Model for the Discharge Kinetics and Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon", J. Appl. Phys. 63, 2532 (1988).
42. M. J. Kushner and T. J. Moratz, "Direct Dissociation of F2 in Electron Beam Pumped Excimer Lasers: The Effect on Electron Density", Appl. Phys. Lett. 52, 1856 (1988).
43. T. J. Moratz, T. D. Saunders and M. J. Kushner, "Heavy Ion vs Electron Beam Excitation of an Excimer Laser", J. Appl. Phys. 64, 3799 (1988).
44. T. L. Peck and M. J. Kushner, "Townsend Transport Coefficients for Surface Flashover Discharges", J. Appl. Phys. 64, 4404 (1988).
45. M. J. McCaughey and M. J. Kushner, "Simulation of the Bulk and Surface Properties of Hydrogenated Amorphous Silicon Deposited from Silane Plasmas", J. Appl. Phys. 65, 186 (1989).
46. T. J. Moratz, T. D. Saunders, and M. J. Kushner, "High Temperature Kinetics in He and Ne Buffered XeF Lasers: The Effect on Absorption", Appl. Phys. Lett. 54, 102 (1989).
47. M. J. McCaughey and M. J. Kushner, "Production of Disilane and Silyl Sticking Coefficients During Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon", Appl. Phys. Lett. 54, 1642 (1989).
48. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, "Cylindrical Magnetron Discharges: I. Current-Voltage Characteristics for dc and rf Driven Discharge Sources", J. Appl. Phys. 65, 3816 (1989).
49. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, "Cylindrical Magnetron Discharges: II. The Formation of dc Bias in rf Driven Discharge Sources", J. Appl. Phys. 65, 3825 (1989).
50. M. Ohwa and M. J. Kushner, "The Effects of Ground State Dynamics on the Emission Spectra of Electric Discharge Pumped XeCl Lasers: A Model for Injection Locking", J. Appl. Phys. 65, 4138 (1989).
51. G. Y. Yeom and M. J. Kushner, "Magnetic Field Effects on Cylindrical Magnetron Reactive Ion Etching of Si/SiO2 in CF4 and CF4/H2 Plasmas", J. Vac. Sci. Tech. A 7, 987 (1989).
52. M. Pinarbasi, N. Maley, L. H. Chou, A. Myers, M. J. Kushner, J. R. Abelson and J. A. Thornton, "Effect of Hydrogen on the Microstructural, Optical and Electronic Properties of a-Si:H Thin Films Deposited by DC Magnetron Reactive Sputtering", J. Vac. Sci. Tech. A 7, 1210 (1989).
53. M. J. Kushner, "Response Times and Energy Partitioning in Electron Beam Excited Plasmas", J. Appl. Phys. 66, 2297 (1989).
54. H. Pak and M. J. Kushner, "Simulation of the Switching Performance of an Optically Triggered Psuedo-Spark Thyratron", J. Appl. Phys. 66, 2325 (1989).
55. M. J. McCaughey and M. J. Kushner, "Electron Transport in Dusty Argon Plasmas", Appl. Phys. Lett. 55, 951 (1989).
56. M. Ohwa, T. J. Moratz and M. J. Kushner, "Excitation Mechanisms of the Electron Beam Pumped Atomic Xenon (5d   6p) Laser", J. Appl. Phys. 66, 5131 (1989).
57. J. V. DiCarlo and M. J. Kushner, "Solving the Spatially Dependent Boltzmann's Equation for the Electron Velocity Distribution Using Flux Corrected Transport", J. Appl. Phys. 66, 5763 (1989).
58. M. J. Kushner, D. E. Hanson and B. I. Schneider, "Reassessment of the Rate Coefficient for Electron Collision Quenching of KrF(B)", Appl. Phys. Lett. 55, 2482 (1989).
59. L. E. Kline and M. J. Kushner, "Computer Simulations of Materials Processing Plasma Discharges", in CRC Critical Reviews in Solid State and Materials Science, Vol. 16, (CRC Press, Florida 1989), pp. 1-35).
60. G. Y. Yeom and M. J. Kushner, "Si/SiO2 Etch Properties Using CF4 and CHF3 in Cylindrical Magnetron Discharges", Appl. Phys. Lett. 56, 857 (1990).
61. M. Pinarbasi, J. R. Abelson and M. J. Kushner, "Reduced Staebler-Wronski Effect in Reactively Sputtered Amorphous Silicon Thin Films", Appl.Phys. Lett. 56, 1685 (1990).
62. M. Pinarbasi, M. J. Kushner and J. R. Abelson, "Electronic Stability of the Reactively Sputtered Hydrogenated Silicon Thin Films: The Effect of Hydrogen Content", J. Vac. Sci. Tech. A 8, 1369 (1990).
63. M. Pinarbasi, J. R. Abelson and M. J. Kushner, "Effect of Hydrogen Content on the Light Induced Defect Generation in Direct Current Magnetron Reactively Sputtered Amorphous Silicon Thin Films", J. Appl. Phys. 68, 2255 (1990).
64. H. Pak and M. J. Kushner, "A Multi-Beam-Bulk Model for Electron Transport During Commutation in an Optically Triggered Pseudospark Thyratron", Appl. Phys. Lett. 57, 1619 (1990).
65. M. J. Kushner, "Return Currents in Large Aperture Electron Beam Excited KrF Lasers", IEEE J. Quant. Electron. 26, 1546-1554 (1990).
66. M. Ohwa and M. J. Kushner, "Energy Loading Effects in Scaling the Atomic Xenon Laser", IEEE J. Quant. Electron. 26, 1639-1646 (1990).
67. P. J. Peters, Y. F. Lan, M. Ohwa and M. J. Kushner, "Impact of Electron Collision Mixing on the Delay Times of an Electron Beam Excited Atomic Xenon Laser", J. Quant. Electron. 26, 1964-1970 (1990).
68. Y. Weng and M. J. Kushner, "A Method for Including Electron-Electron Collisions in Monte Carlo Simulations of Electron Swarms in Partially Ionized Plasmas", Phys. Rev. A. 42, 6192 (1990).
69. M. J. Kushner, "Microarcs as a Termination Mechanism of Optical Pulses in Electric Discharge Excited KrF Lasers", Trans. Plasma Science19, 387 (1991).
70. M. J. Kushner and D. B. Graves, "Guest Editorial", Special Issue of Transactions on Modeling Collisional Low Temperature Plasmas, IEEE Trans. Plasma Science 19, 63 (1991).
71. G. N. Hays, W. J. Alford, M. Ohwa and M. J. Kushner, "The Effects of He Addition on the Performance of the Fission Fragment Excited Ar/Xe Atomic Xenon Laser", J. Appl. Phys. 69, 1843 (1991).
72. M. B. Chang, J. H. Balbach, M. J. Rood and M. J. Kushner, "Removal of SO2 from Gas Streams Using a Dielectric Barrier Discharge", J. Appl. Phys. 69, 4409 (1991).
73. M. J. McCaughey and M. J. Kushner, "A Model for Particulate Contaminated Glow Discharges", J. Appl. Phys. 69, 6952 (1991).
74. T. J. Sommerer and M. J. Kushner, "Translationally Hot Neutrals in Etching Discharges", J. Appl. Phys. 70, 1240 (1991).
75. H. Hwang, R. Hui, K. James and M. J. Kushner, "Fluorocarbon Impurities in E-Beam Excited KrF Lasers", J. Appl. Phys. 69, 7419 (1991).
76. T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey and M. J. Kushner, "Monte Carlo Fluid Hybrid Model of the Accumulation of Dust Particles at Sheath Edges in Radio Frequency Discharges", Appl. Phys. Lett. 59, 638 (1991).
77. S. J. Choi, M. J. McCaughey, T. J. Sommerer and M. J. Kushner, "Perturbation of the Cathode Fall in dc Glow Discharges by Particulate Contamination", Appl. Phys. Lett. 59, 3102 (1991).
78. H. Pak and M. J. Kushner, "Breakdown Characteristics in Nonplanar Geometries and Hollow Cathode Pseudospark Switches", J. Appl. Phys. 71, 94 (1992).
79. A. Garscadden, M. J. Kushner and J. G. Eden, "Partially Ionized Plasma Physics and Gas Discharge Lasers", IEEE Transactions on Plasma Science 19, 1013 (1991).
80. M. B. Chang, M. J. Kushner and M. J. Rood, "Gas Phase Removal of NO from Gas Streams via Dielectric Barrier Discharges", Environmental Science and Technology 26, 777 (1992).
81. T. J. Sommerer and M. J. Kushner, "Numerical Investigation of the Kinetics and Chemistry of rf Glow Discharge Plasmas Sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 Using a Monte Carlo-Fluid Hybrid Model", J. Appl. Phys. 71, 1654 (1992).
82. M. J. Kushner, "Simulation of the Gas Phase Processes in Remote Plasma Activated Chemical Vapor Deposition of Silicon Dielectrics Using Rare Gas-Silane-Ammonia Mixtures", J. Appl. Phys. 71, 4173 (1992).
83. Y. Weng and M. J. Kushner, "Electron Energy Distributions in Electron Cyclotron Resonance Discharges for Materials Processing", J. Appl. Phys. 72, 33 (1992).
84. T. J. Sommerer, H. Pak and M. J. Kushner, "Cathode Heating Mechanisms in Pseudospark (Back-Lighted Thyratron) Plasma Switches", J. Appl. Phys. 72, 3374 (1992).
85. T. J. Sommerer and M. J. Kushner, "A Monte Carlo-Fluid Model of Chlorine Atom Production in Cl2, HCl and CCl4 Radio Frequency Discharges for Plasma Etching", J. Vac. Sci. Tech. B 10, 2179 (1992).
86. M. B. Chang, M. J. Kushner and M. J. Rood, "Removal of SO2 and Simultaneous Removal of SO2 and NO from Simulated Flue Gas Streams via Dielectric Barrier Discharge Plasmas", Plasma Chemistry and Plasma Processing 12, 565 (1992).
87. M. B. Chang, M. J. Kushner and M. J. Rood, "Removal of SO2 and NO from Gas Streams with Combined Plasma Photolysis ", J. Environmental Engr. 119, 414 (1993).
88. M. Hartig and M. J. Kushner, "Radially Dependent Solutions of Boltzmann's Equation Using a Modified 2-Term Spherical Harmonic Expansion", J. Appl. Phys. 73, 1080 (1993).
89. D. G. Storch and M. J. Kushner, "Destruction Mechanisms for Formaldehyde in Atmospheric Pressure Low Temperature Plasmas" , J. Appl. Phys. 73, 51 (1993).
90. J. W. Shon, M. J. Kushner, G. A. Hebner and G. N. Hays, "Predictions for Gain in the Fission Fragment Excited Atomic Xenon Laser", J. Appl. Phys. 73, 2686 (1993).
91. M. J. Hartig and M. J. Kushner, "A Monte Carlo-Hydrodynamic Simulation of Neutral Radical Transport in Low Pressure Remote Plasma Activated Chemical Vapor Deposition", Appl. Phys. Lett. 62, 1594 (1993).
92. P. J. Hargis, M. J. Kushner and 27 other authors, "The GEC RF Reference Cell: A Defined Parallel-Plate Radio-Frequency System for Experimental and Theoretical Studies of Plasma-Processing Discharges", Reviews of Scientific Instruments 65, 140 (1994).
93. M. J. Kushner, "Pulsed Plasma-Pulsed Injection Sources for Remote Plasma Activated Chemical Vapor Deposition", J. Appl. Phys. 73, 4098 (1993).
94. S. J. Choi and M. J. Kushner, "The Role of Negative Ions in the Formation of Particles in Low Pressure Plasmas", J. Appl. Phys. 74, 853 (1993).
95. P. J. Stout and M. J. Kushner, "A Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of SiO2 using O2/TEOS Chemistry", J. Vac. Sci. Tech. A 11, 2562 (1993).
96. S. J. Choi and M. J. Kushner, "A Simulation of the Shielding of Dust Particles in Low Pressure Glow Discharges: Electron-Dust and Ion-Dust Particle Cross Sections", Appl. Phys. Lett. 62, 2197 (1993).
97. J. W. Shon, R. L. Rhoades, J. T. Verdeyen and M. J. Kushner, "Short Pulse Electron Beam Excitation of the High Pressure Atomic Ne Laser", J. Appl. Phys. 73, 8059 (1993).
98. P. L. G. Ventzek, R. J. Hoekstra, T. J. Sommerer and M. J. Kushner, "A 2-dimensional Hybrid Model of Inductively Coupled Plasma Sources for Etching", Appl. Phys. Lett. 63, 605 (1993).
99. D. Evans, L. A. Rosocha, G. K. Anderson, J. J. Coogan, and M. J. Kushner, "Plasma Remediation of Trichloroethylene in Silent Discharge Plasmas", J. Appl. Phys. 74, 5378 (1993).
100. M. J. Kushner, "Plasma Chemistry of He/SiH4/O2/N2O Mixtures for Remote Plasma Activated Chemical Vapor Deposition of Silicon Dioxide", J. Appl. Phys. 74, 6538 (1993).
101. G. A. Hebner, J. W. Shon and M. J. Kushner, "Temperature Dependent Gain in the Atomic Xe Laser", Appl. Phys. Lett. 63, 2872 (1993).
102. H. H. Hwang and M. J. Kushner, "Ion Energy Distributions in rf Discharges Sustained in Gas Mixtures Obtained Using a Monte Carlo-Fluid Hybrid Model: Endothermic Processes and Ion Holes", Plasma Sources Sci. Technol. 3, 190 (1994).
103. S. J. Choi and M. J. Kushner, "A Particle-in-Cell Simulation of Dust Charging and Shielding in Low Pressure Glow Discharges", IEEE Trans. Plasma Science 22, 138 (1994).
104. J. W. Shon and M. J. Kushner, "Excitation Mechanisms and Gain Modeling of the High Pressure Ar Laser in He/Ar Mixtures", J. Appl. Phys. 75, 1883 (1994).
105. P. L. G. Ventzek, R. J. Hoekstra, M. J. Kushner, "2-Dimensional Modeling of High Plasma Density Inductively Coupled Sources for Materials Processing", J. Vac. Sci. Tech. B. 12, 461 (1994).
106. S. J. Choi and M. J. Kushner, "Mutual Shielding of Closely Spaced Dust Particles in Low Pressure Plasmas", J. Appl. Phys. 75, 3351 (1994).
107. J. L. Shohet, E. B. Wickesberg, and M. J. Kushner, "Computer Simulation of Mass-Selective Plasma-Source Ion Implantation", J. Vac. Sci. Technol. A. 12, 1380 (1994).
108. S. J. Choi, P. L. G. Ventzek, R. J. Hoekstra and M. J. Kushner, "Spatial Distributions of Dust Particles in Plasmas Generated by Capacitively Coupled Radio Frequency Discharges", Plasma Sources Sci. Technol. 3, 418 (1994).
109. P. L. G. Ventzek, M. Grapperhaus and M. J. Kushner, "Investigation of Electron Source and Ion Flux Uniformity in High Plasma Density Inductively Plasma Tools Using 2-dimensional Modeling", J. Vac. Science Tech. B 12, 3118 (1994).
110. P. J. Stout and M. J. Kushner, "Characteristics of an Optically Activated Pulsed Power GaAs(Si:Cu) Switch Obtained by 2-dimensional Modeling", J. Appl. Phys. 77, 3518 (1995).
111. R. J. Hoekstra and M. J. Kushner, "The Effect of Sub-wafer Dielectrics on Plasma Properties in Plasma Etching Reactors", J. Appl. Phys. 77, 3668 (1995).
112. A. C. Gentile and M. J. Kushner, "Plasma Remediation of Perchloroethylene (PCE) in Humid Gas Streams", J. Appl. Phys. 78, 2977 (1995).
113. A. C. Gentile and M. J. Kushner, "Reaction Chemistry and Optimization of Plasma Remediation of NxOy from Gas Streams", J. Appl. Phys. 78, 2074 (1995).
114. F. Y. Huang and M. J. Kushner, "A Hybrid Model for Particle Transport and Electron Energy Distributions in Positive Column Discharges Using Equivalent Species Transport", J. Appl. Phys. 78, 5909 (1995).
115. H. H. Hwang, J. K. Olthoff, R. J. Van Brunt, S. B. Radovanov, and M. J. Kushner, "Evidence for Inelastic Processes for N3+ and N4+from Ion Energy Distributions in He/N2 rf Glow Discharges", J. Appl. Phys. 79, 93 (1996).
116. M. J. Kushner and D. N. Ruzic, "Guest Editorial: Speical Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 24, 4 (1996).
117. W. Z. Collison and M. J. Kushner, "Conceptual Design of Advanced Inductively Coupled Plasma Etching Tools Using Computer Modeling ", Trans. Plasma Sci. 24, 135 (1996).
118. P. J. Stout and M. J. Kushner, "Modeling of High Power Semiconductor Switches Operated in the Non-linear Mode", J. Appl. Phys. 79, 2084 (1996).
119. R. J. Hoekstra and M. J. Kushner, "Predictions of Ion Energy Distributions and Radical Fluxes in rf Biased Inductively Coupled Plasma Etching Reactors", J. Appl. Phys. 79, 2275 (1996).
120. W. Z. Collison and M. J. Kushner, "Ion Drag Effects in Inductively Coupled Plasmas for Etching", Appl. Phys. Lett. 68, 903 (1996).
121. A. C. Gentile and M. J. Kushner, "Microstreamer Dynamics During Plasma Remediation of NxOy in Dielectric Barrier Discharges", J. Appl. Phys. 79, 3877 (1996).
122. F. Y. Huang, H. H. Hwang and M. J. Kushner, "A Model for Transport and Agglomeration of Particles in Reactive Ion Etching Plasma Reactors:" , J. Vac. Sci. Technol. A 14, 562 (1996).
123. W. Tan, R. J. Hoekstra and M. J. Kushner, "A Time Dependent Propagator Method for Long Mean Free Path Transport of Neutral Particles in Plasma Processing Reactors", J. Appl. Phys. 79, 3423 (1996).
124. A. C. Gentile and M. J. Kushner, "The Effect of CO2 on the Plasma Remediation of NxOy", Appl. Phys. Lett. 68, 2064 (1996).
125. M. J. Kushner, W. Z. Collison and D. N. Ruzic, "Electron-Beam Sustained Radio Frequency Discharges for Plasma Processing", J. Vac. Sci. Technol. A 14, 2094 (1996).
126. H. H. Hwang and M. J. Kushner, "Regimes of Particle Trapping in Inductively Coupled Plasma Processing Reactors", Appl. Phys. Lett. 68, 3716 (1996).
127. M. J. Kushner, W. Z. Collison, M. J. Grapperhaus, J. P. Holland and M. S. Barnes, "A 3-dimensional Model for Inductively Coupled Plasma Etching Reactors: Azimuthal Symmetry and Coil Properties", J. Appl. Phys. 80, 1337 (1996).
128. I. Peres and M. J. Kushner, "Spatial Distributions of Power and Ion Densities in rf Excited Remote Plasma Reactors", Plasma Sources Sci. Technol. 5, 499 (1996).
129. P. N. Barnes and M. J. Kushner, "Formation of XeI(B) in Low Pressure Inductive Radio Frequency Discharges Sustained in Mixtures of Xe and I2", J. Appl. Phys. 80, 5593 (1996).
130. M. J. Grapperhaus and M. J. Kushner, "A Semi-Analytic Sheath Model Integrated into a 2-dimensional Model for Radio Frequency Biased, Inductively Coupled Plasma Etching Reactors", J. Appl. Phys.81, 569 (1997).
131. R. J. Hoekstra, M. J. Grapperhaus and M. J. Kushner, "An Integrated Plasma Equipment Model for Polysilicon Etch Profiles in an Inductively Coupled Plasma Reactor with Subwafer and Super wafer Topography", J. Vac. Sci. Technol. A. 15, 1913 (1997).
132. F. Y. Huang and M. J. Kushner, "Shapes of Agglomerates in Plasma Etching Reactors", J. Appl. Physics. 81, 5960 (1997).
133. S. Rauf and M. J. Kushner, "A Model for Non-Collisional Heating in Inductively Coupled Plasma Processing Sources", J. Appl. Phys. 81, 5966 (1997).
134. H. H. Hwang and M. J. Kushner, "Simulation of the Formation of Coulomb Liquids and Solids in Dusty Plasmas", J. Appl. Phys. 82, 2106 (1997).
135. P. N. Barnes and M. J. Kushner, "Ion-ion Neutralization of Iodine in rf Inductive Discharges of Xe and I2 Mixtures", J. Appl. Phys. 82, 2150 (1997).
136. S. Rauf and M. J. Kushner, "A Self Consistent Analytical Model for Non-Collisional Heating in Low Pressure Plasmas", Plasma Sources Sci. Technol. 6, 518 (1997).
137. S. Rauf and M. J. Kushner, "Argon Metastable Densities in Radio Frequency Ar, Ar/O2 and Ar/CF4 Electrical Discharges", J. Appl. Phys. 82, 2805 (1997).
138. M. J. Kushner, "Consequences of Asymmetric Pumping in Low Pressure Plasma Processing Reactors: A 3-dimensional Modeling Study", J. Appl. Phys. 82, 5312 (1997).
139. M. J. Grapperhaus, Z. Krivokapic and M. J. Kushner, "Design Issues in Ionized Metal Physical Vapor Deposition of Copper", J. Appl. Phys. 83, 35 (1998).
140. S. Rauf and M. J. Kushner, "Virtual Plasma Equipment Model: A Tool for Investigating Feedback Control in Plasma Processing Equipment", IEEE Trans. Semiconductor Manufact. 11, 486 (1998).
141. S. Rauf and M. J. Kushner, "The Effect of Radio Frequency Plasma Processing Reactor Circuitry on Plasma Characteristics", J. Appl. Phys. 83, 5087 (1998).
142. E. R. Keiter and M. J. Kushner, "Plasma Transport Around Dust Particles Having Complex Shapes", J. Appl. Phys. 83, 5670 (1998).
143. H. H. Hwang, E. R. Keiter and Mark J. Kushner, "Consequences of 3-dimensional Physical and Electromagnetic Structures on Dust Particle Trapping in High Plasma Density Material Processing Discharges",J. Vac. Sci. Technol. A.16, 2454 (1998).
144. R. J. Hoekstra and M. J. Kushner, "Microtrenching Resulting from Specular Reflection During Chlorine Etching of Silicon", in J. Vac. Sci. Technol. B, 16, 2102 (1998).
145. R. J. Hoekstra and M. J. Kushner, "Comparison of 2-d and 3-d Models for Profile Simulation of poly-Si Etching: When is a 3-d Model Required?",J. Vac. Sci. Techol. A, 16, 3274 (1998).
146. X. Xu and M. J. Kushner, "Ion Composition of Expanding Microdischarges in Dielectric Barrier Discharges", J. Appl. Phys. 83, 7522 (1998).
147. X. Xu and M. J. Kushner, "Multiple Microdischarge Dynamics Dielectric Barrier Discharges", J. Appl. Phys. 84, 4153 (1998).
148. P. N. Barnes and M. J. Kushner, "Reactions in the Afterglow of Time Modulated Inductive Discharges of Xe and I2 Mixtures", J. Appl. Phys. 84, 4727 (1998).
149. S. Rauf and M. J. Kushner, "Diagnostic Technique for Measuring Plasma Parameters Near Surfaces in Radio Frequency Discharges", Appl. Phys. Lett. 73, 2730 (1998).
150. S. Rauf and M. J. Kushner, "Dynamics of a Coplanar-Electrode Plasma Display Panel Cell. I. Basic Operation", J. Appl. Phys. 85, 3460 (1999).
151. S. Rauf and M. J. Kushner, "Dynamics of a Coplanar-Electrode Plasma Display Panel Cell. II. Cell Optimization", J. Appl. Phys. 85, 3470 (1999).
152. S. Rauf and M. J. Kushner, "Controller Design Issues in the Feedback Control of Radio Frequency Plasma Processing Reactors", J. Vac. Sci. Technol. A 17, 704 (1999).
153. S. Rauf and M. J. Kushner, "Operation of a Coplanar-Electrode Plasma Display Panel Cell", IEEE Trans. Plasma Sci. 27, 10 (1999).
154. E. Keiter and M. J. Kushner, "Radical and Electron Densities in a High Plasma Density-Chemical Vapor Deposition Reactor from a Three-Dimensional Simulation", IEEE Trans. Plasma Sci. 27, 62 (1999).
155. R. L. Kinder and M. J. Kushner, "TE01 Excitation of an Electron Cyclotron Resonance Plasma Source",IEEE Trans. Plasma Sci. 27, 64 (1999).
156. X. Xu and M. J. Kushner, "The Consequences of Remnant Surface Charges on Microdischarges Spreading in Dielectric Barrier Discharges", IEEE Trans. Plasma Sci. 27, 108 (1999).
157. M. J. Kushner and S. Rauf, "Guest Editorial: Second Triennual Special Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 27, 4 (1999).
158. R. L. Kinder and M. J. Kushner, "Consequences of Mode Structure on Plasma Properties in Electron Cyclotron Resonance Sources", J. Vac. Sci. Technol. A 17, 2421 (1999).
159. S. Rauf and M. J. Kushner, "Nonlinear Dynamics of Radio Frequency Plasma Processing Reactors Powered by Multifrequency Sources", Trans. Plasma Sci. 27, 1329 (1999).
160. R. Dorai and M. J. Kushner, "Effect of Propene on the Remediation of NOx from Engine Exhausts", in "Non-Thermal Plasma for Exhaust Emission Control: NOx, HC, and Particulates [SP-1483]", (Society of Automotive Engineeers, PA, 1999).
161. X. Xu, S. Rauf and M. J. Kushner, "Plasma Abatement of Perfluorocompounds in Inductively Coupled Plasma Reactors", J. Vac. Sci. Techol. A, 18, 213 (2000).
162. D. Zhang and M. J. Kushner, "Surface Kinetics and Plasma Equipment Model for Si Etching by Fluorocarbon Plasmas", J. Appl. Phys. 87, 1060 (2000).
163. T. van der Straaten and M. J. Kushner, "A Monte-Carlo Model of Xenon Resonance Radiation Transport in a Plasma Display Panel Cell: Transition from Optically Thick to Thin regimes", J. Appl. Phys. 87, 2700 (2000).
164. J. Lu and M. J. Kushner, "Effect of Sputter Heating in Ionized Metal Physical Vapor Deposition Reactors", J. Appl. Phys. 87, 7198 (2000).
165. M. J. Kushner and D. Zhang, "An Electron Impact Cross Section Set for CHF3", J. Appl. Phys. 88, 3231 (2000).
166. R. Dorai and M. J. Kushner, "Consequences of Propene and Propane on Plasma Remediation of NOx", J. Appl. Phys. 88, 3739 (2000).
167. R. Dorai, K. Hassouni and M. J. Kushner, "Interaction Between Soot Particles and NOx During Dielectric Barrier Discharge Plasma Remediation of Simulated Diesel Exhaust", J. Appl. Phys. 88, 6060 (2000).
168. D. Zhang and M. J. Kushner, "Mechanisms for CF2 Radical Generation and Loss on Surfaces in Fluorocarbon Plasmas", J. Vac. Sci. Technol. A 18, 2661 (2000).
169. J. Lu and M. J. Kushner, "Inflight Electron Impact Excitation in Ionized Metal Physical Vapor Deposition", J. Appl. Phys. 89, 878 (2001).
170. R. Kinder and M. J. Kushner, "Wave Propagation and Power Deposition in Magnetically Enhanced Inductively Coupled and Helicon Plasma Sources", J. Vac. Sci. Technol. A 19, 76 (2001).
171. R. Dorai and M. J. Kushner, "Effect of Multiple Pulses on the Plasma Chemistry During the Remediation of NOx Using Dielectric Barrier Discharges", J. Phys. D 34, 574 (2001).
172. D. Zhang and M. J. Kushner, "Investigation of Surface Reactions During C2F6 Plasma Etching of SiO2 with Equipment and Feature Scale Models", J. Vac. Sci. Technol. A 19, 524 (2001).
173. M. J. Kushner, "Core Values and the New Business Model", ASEE Prism 10, 65 (2001).
174. J. Lu and M. J. Kushner, "Sources of Azimuthal Asymmetries in Ionized Metal Physical Vapor Deposition Processes", Plasma Sources Sci. Technol. 10, 502 (2001).
175. J. Lu and M. J. Kushner, "Trench Filling by Ionized Metal Physical Vapor Deposition", J. Vac. Sci. Technol. A 19, 2652 (2001).
176. P. Subramonium and M. J. Kushner, "Pulsed Inductively Coupled Chlorine Plasmas in the Presence of a Substrate Bias", Appl. Phys. Lett. 79, 2145 (2001).
177. R. Kinder and M. J. Kushner, "Non-Collisional Heating and Electron Energy Distributions in Magnetically Enhanced Inductively Coupled and Helicon Plasma Sources", J. Appl. Phys. 90, 3699 (2001).
178. P. Subramonium and M. J. Kushner, "Two-dimensional Modeling of Long-term Transients in Inductively Coupled Plasmas using Moderate Computational Parallelism. I. Ar Pulsed Plasmas", J. Vac. Sci. Technol. A 20, 313 (2002).
179. P. Subramonium and M. J. Kushner, "Two-dimensional Modeling of Long-term Transients in Inductively Coupled Plasmas using Moderate Computational Parallelism. II. ArCl2 Pulsed Plasmas", J. Vac. Sci. Technol. A 20, 325 (2002).
180. V. Vyas and M. J. Kushner, "Formation of Coulomb Crystals in a Capacitively Coupled Plasma", Trans. Plasma Science 30, 92 (2002).
181. R. Kinder and M. J. Kushner, "Three-Dimensional Fields and Temperatures in a Squat Helicon Reactor", Trans. Plasma Science 30, 134 (2002).
182. B. Lay, S. Rauf and M. J. Kushner, "Gap Closure in a Cold Metal Halid Lamp", Trans. Plasma Science 30, 190 (2002).
183. M. J. Kushner, "Guest Editorial: Special Issue of the IEEE Transactions on Plasma Science: 3rd Triennial Issue on Images in Plasma Science", Trans. Plasma Science 30, 5 (2002).
184. A. Sankaran and M. J. Kushner, "Harmonic Content of Electron Impact Source Functions in Inductively Coupled Plasmas Using an "On-the-Fly" Monte Carlo Technique", J. Appl. Phys. 92, 736 (2002).
185. T. J. Pricer, M. J. Kushner and R. C. Alkire, " Monte Carlo Simulation of the Electrodeposition of Copper I. Additive-Free Acidic Sulfate Solution ", J. Electrochem. Soc. 149, c396 (2002).
186. T. J. Pricer, M. J. Kushner and R. C. Alkire, " Monte Carlo Simulation of the Electrodeposition of Copper II. Acid Sulfate Solution with Blocking Additive ", J. Electrochem. Soc. 149, c406 (2002).
187. V. Vyas, G. A. Hebner and M. J. Kushner, " A Self-consistent Three-dimensional Model of Dust Particle Transport and Formation of Coulomb Crystals in Plasma Processing Reactors ", J. Appl. Phys. 92, 6451 (2002).
188. R. Dorai and M. J. Kushner, " Repetitively Pulsed Plasma Remediation of NOx in Soot Laden Exhaust ", J. Phys. D 35, 2954 (2002).
189. Alex V. Vasenkov and Mark J. Kushner, " Electron Energy Distributions and Anomalous Skin Depth Effects in High-Plasma-Density Inductively Coupled Discharges ", Phys. Rev. E 66, 066411 (2002).
190. Brian Lay, Richard S Moss, Shahid Rauf and Mark J. Kushner, " Breakdown Processes in Metal Halide Lamps ", Plasma Sources Science Technology 12, 8 (2003).
191. Rajesh Dorai and Mark J. Kushner, " A Model for Plasma Modification of Polypropylene Using Atmospheric Pressure Discharges ", J. Phys. D 36, 666 (2003).
192. Arvind Sankaran and Mark J. Kushner, " Fluorocarbon Plasma Etching and Profile Evolution of Porous Low-dielectric-constant Silica ", Appl. Phys. Lett. 82, 1824 (2003).
193. M. Strobel, V. Jones, C. S. Lyons, M. Ulsh, M. J. Kushner, R. Dorai, and M. C. Branch, " A Comparison of Corona-treated and Flame-treated Polypropylene Films ", Plasmas and Polymers 8, 61 (2003).
194. J. Hoard, T. J. Wallington, R. L. Bretz, A. Malkin, R. Dorai, and M. J. Kushner, " Importance of O(3P) Atoms and OH Radicals in Hydrocarbon Oxidation during the Non-thermal Plasma Treatment of Diesel Exhaust Inferred using Relative Rate Methods ", Int. J. Chem. Kinetics 35, 231 (2003).
195. R. Dorai and M. J. Kushner, " Consequences of unburned hydrocarbons on microstreamer dynamics and chemistry during plasma remediation of NOx using dielectric barrier discharges ", J. Phys. D 36, 1075 (2003).
196. M. J. Kushner, " Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Ar Discharges ", J. Appl. Phys. 94, 1436 (2003).
197. A. V. Vasenkov and M. J. Kushner, " Harmonic Content and Time Variation of Electron Energy Distributions in High-plasma-density, Low-pressure Inductively Coupled Discharges ", J. Appl. Phys. 94, 2223 (2003).
198. R. L. Kinder, A. R. Ellingboe and M. J. Kushner, " H- to W-mode Transitions and Properties of a Multimode Helicon Plasma Reactor ", Plasma Sources Sci. Technol. 12, 561 (2003).
199. D. B. Graves and M. J. Kushner, " Influence of Modeling and Simulation on the Maturation of Plasma Technology: Feature Evolution and Reactor Design ", J. Vac. Sci. Technol. A 21, s152 (2003).
200. A. V. Vasenkov and M. J. Kushner, " Angular Anisotropy of Electron Energy Distributions in Inductively Coupled Plasmas ", J. Appl. Phys. 94, 5522 (2003).
201. A. V. Vasenkov and M. J. Kushner, " Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Ar / C4F8 / O2 discharges ", J. Appl. Phys. 95, 834 (2004).
202. M. J. Kushner, " Modeling of Microdischarge Devices: Pyramidal Structures ", J. Appl. Phys. 95, 846 (2004).
203. X. Li, L. Ling, X. Hua, G. S. Oehrlein, Y. Wang, A. V. Vasenkov and M. J. Kushner, " Properties of C4F8 inductively coupled plasmas. I. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2 ", J. Vac. Sci. Technol. A 22, 500 (2004).
204. A. V. Vasenkov, X. Li, G. S. Oehrlein and M. J. Kushner, " Properties of C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C4F8/O2 discharges ", J. Vac. Sci. Technol. A 22, 511 (2004).
205. P. Subramonium and M. J. Kushner, " Extraction of negative ions from pulsed electronegative inductively coupled plasmas having a radio-frequency substrate bias ", J. Vac. Sci. Technol. A 22, 534 (2004).
206. K. Rajaraman and M. J. Kushner, " A Monte Carlo Simulation of Radiation Trapping in Electrodeless Gas Discharge Lamps ", J. Phys. D 37, 1780 (2004).
207. P. Subramoniuim and M. J. Kushner, " Pulsed Inductively Coupled Plasmas as a Method to Recoup Uniformity: Three-dimensional Modeling Study ", Appl. Phys. Lett. 85, 721 (2004).
208. P. Subramoniuim and M. J. Kushner, " Pulsed Plasmas as a Method to Improve Uniformity During Materials Processing ", J. Appl. Phys. 96, 82 (2004).
209. A. Sankaran and M. J. Kushner, " Integrated Feature Scale Modeling of Plasma Processing of Porous and Solid SiO2. I. Fluorcarbon Etching ", J. Vac. Sci. Technol. A 22, 1242 (2004).
210. A. Sankaran and M. J. Kushner, " Integrated Feature Scale Modeling of Plasma Processing of Porous and Solid SiO2. II. Residual Flurocarbon Polymer Stripping and Barrier Layer Deposition ", J. Vac. Sci. Technol. A 22, 1260 (2004).
211. D. L. Carroll, J. T. Verdeyen, D. M. King, J. W. Zimmerman, J. K. Laystrom, B. S. Woodard, N. Richardson, K. Kittell, Mark J. Kushner, and W. C. Solomon, " Measurement of Positive Gain on the 1315 nm Transition of Atomic Iodine Pumped by O2(a1D) Produced in an Electric Discharge ", Appl. Phys. Lett. 85, 1320 (2004).
212. R. S. Moss, J. G. Eden and M. J. Kushner " Avalanche Processes in an Idealized Lamp: I. Measurements of Formative Breakdown Time ", J. Phys. D. 37, 2502 (2004).
213. A. Bhoj and M. J. Kushner " Avalanche Processes in an Idealized Lamp: II. Modeling of Breakdown in Ar/Xe Electric Discharges ", J. Phys. D. 37, 2510 (2004).
214. D. S. Stafford and M. J. Kushner " O2(1D) Production in He/O2 Mixtures in Flowing Low Pressure Plasmas ", J. Appl. Phys. 96, 2451 (2004).
215. A. Sankaran and M. J. Kushner " Etching of Porous and Solid SiO2 in Ar/c-C4F8, O2/c-C4F8 and Ar/O2/c-C4F8 Plasmas ", J. Appl. Phys. 97, 023307 (2005).
216. V. Vyas and M. J. Kushner " Effect of Ion Streaming on Particle-particle Interactions in a Dusty Plasma ", J. Appl. Phys. 97, 043303 (2005).
217. D. L. Carroll,J. T. Verdeyen, D. M. King, J. W. Zimmerman, J. K. Laystrom, B. S. Woodard, G. F. Benavides, K. Kittell, D. S. Stafford, M. J. Kushner and W. C. Solomon " Continuous-wave Laser Oscillation on the 1315 nm Transition of Atomic Iodine Pumped by O2(1-delta) Produced in an Electric Discharge ", Appl. Phys. Lett. 86, 111104 (2005).
218. M. J. Kushner and G. A. Hebner "Guest Editorial: Fourth Triennual Special Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 33, 224 (2005).
219. A. N. Bhoj and M. J. Kushner, " Polymer Plasma Interactions in a Dielectric Barrier Discharge ", Trans. Plasma Sci. 33, 250 (2005).
220. A. Agarwal and M. J. Kushner, " Time Evolution of Ion Energy Distributions for Plasma Doping ", Trans. Plasma Sci. 33, 252 (2005).
221. M. J. Kushner and A. V. Vasenkov, " Electron Velocity Distributions in an Inductively Coupled Plasma ", Trans. Plasma Sci. 33, 388 (2005).
222. A. N. Bhoj and M. J. Kushner, " Plasma Dynamics During Breakdown in an HID Lamp ", Trans. Plasma Sci. 33, 518 (2005).
223. M. J. Kushner, " Modelling of Microdischarge Devices: Plasma and Gas Dynamics ", J. Phys. D 38, 1633 (2005).
224. A. Agarwal and M. J. Kushner, " Effect of Nonsinusoidal Bias Waveforms on Ion Energy Distributions and Fluorocarbon Plasma Etch Selectivity ", J. Vac. Sci. Technol. A 23, 1440 (2005).
225. D. Shane Stafford and M. J. Kushner " O2(1-delta) Production in Flowing He/O2 Plasmas I: Axial Transport and Pulsed Power Formats ", J. Appl. Phys. 98, 073303 (2005).
226. R. Arakoni, D. Shane Stafford, N. Y. Babaeva and M. J. Kushner " O2(1-delta) Production in Flowing He/O2 Plasmas II: 2-dimensional Modeling ", J. Appl. Phys. 98, 073304 (2005).
227. A. N. Bhoj and M. J. Kushner " Multiscale Simulation of Functionalization of Rough Polymer Surfaces Using Atmospheric Pressure Plasmas ", J. Phys. D 39, 1594 (2006).
228. Natalia Yu. Babaeva. R. A. Arakoni and M. J. Kushner " Production of O2(1-delta) in Flowing Plasmas Using Spiker-Sustainer Excitation ", J. Appl. Phys. 99, 113306 (2006).
229. Natalia Yu. Babaeva. A. N. Bhoj and M. J. Kushner " Streamer Dynamics in Gases Containing Dust Particles ", Plasma Source Sci. Technol. 15, 591 (2006).
230. V. Vyas and M. J. Kushner " Scaling of Hollow Cathode Magnetrons for Ionized Metal Physical Vapor Deposition ", J. Vac. Sci. Technol. A 24, 1955 (2006).
231. A. Agarwal and M. J. Kushner " Characteristics of Pulsed Plasma Doping Sources for Ultrashallow Junction Formation ", J. Appl. Phys. 101, 063305 (2007).
232. R. A. Arakoni, A. N. Bhoj and M. J. Kushner " H2 Generation in Ar/NH3 Microdischarges ", J. Phys. D. 40, 2476 (2007).
233. N. Y. Babaeva and M. J. Kushner " Penetration of Plasma into the Wafer-Focus Ring Gap in Capacitively Coupled Plasmas ", J. Appl. Phys. 101, 113307 (2007).
234. N. Y. Babaeva, R. A. Arakoni and M. J. Kushner " O2(1-delta) Production in High Pressure flowing He/O2 Plasmas: Scaling and Quenching ", J. Appl. Phys. 101, 123306 (2007).
235. R. A. Arakoni, N. Y. Babaeva and M. J. Kushner " O2(1-delta) Production and Gain in Plasma Pumped Oxygen-Iodine Lasers: Consequences of NO and NO2 Additives ", J. Phys. D 40, 4793 (2007).
236. Y. Yang and M. J. Kushner " Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Two Frequency Discharges ", J. Vac. Sci. Technol. A 25, 1420 (2007).
237. A. N. Bhoj and M. J. Kushner " Continuous Processing of Polymers in Repetitively Pulsed Atmospheric Pressure Discharges with Moving Surfaces and Gas Flow ", J. Phys. D 40, 6953 (2007).
238. N. Y. Babaeva and M. J. Kushner " Ion Energy and Angular Distributions into the Wafer Focus Ring Gap in Capacitively Coupled Discharges ", J. Phys. D 41, 062004 (2008).
239. A. Agarwal and M. J. Kushner " Seasoning of Plasma Etching Reactors: Ion energy Distributions to Walls and Real-time and Run-to-run Control Strategies ", J. Vac. Sci. Technol. A 26, 498 (2008).
240. R. Arakoni, J. J. Ewing and M. J. Kushner " Microdischarges For Use As Microthrusters: Modelling and Scaling ", J. Phys. D 41, 105208 (2008).
241. A. N. Bhoj and M. J. Kushner " Repetitively Pulsed Atmospheric Pressure Discharge Treatment of Rough Polymer Surfaces: I. Humid air discharges ", Plasma Sources Sci. Technol. 17, 035024 (2008).
242. A. N. Bhoj and M. J. Kushner " Repetitively Pulsed Atmospheric Pressure Discharge Treatment of Rough Polymer Surfaces: II. Treatment of micro-beads in He/NH3/H2O and He/O2/H2O mixtures ", Plasma Sources Sci. Technol. 17, 035025 (2008).
243. N. Yu. Babaeva and M. J. Kushner, " Guest Editorial: 5th Triennial Special Issue of Transactions on Plasma Science on Images in Plasma Science ", Trans. Plasma Sci. 36, 862 (2008).
244. N. Yu. Babaeva and M. J. Kushner, " Streamer Branching: The Role of Inhomogeneities and Bubbles ", Trans. Plasma Sci. 36, 892 (2008).
245. A. Agarwal and M. J. Kushner, " Plasma Atomic Layer Etching Using Conventional Plasma Equipment ", J. Vac. Sci. Technol. A 27, 37 (2009).
246. N. Yu. Babaeva and M. J. Kushner, " Effect of inhomogeneities on streamer propagation: I. Intersection with isolated bubbles and particles ", Plasma Sources Sci. Technol 18, 035009 (2009).
247. N. Yu. Babaeva and M. J. Kushner, " Effect of inhomogeneities on streamer propagation: II. Streamer dynamics in high pressure humid air with bubbles ", Plasma Sources Sci. Technol 18, 035009 (2009).
248. N. Yu. Babaeva and M. J. Kushner, " Structure of positive streamers inside gaseous bubbles immersed in liquids ", J. Phys. D 42, 132003 (2009).
249. J. Shoeb and M. J. Kushner, " Mechanisms for Plasma Etching of HfO₂ Gate-Stacks With Si Selectivity and Photoresist Trimming ", J. Vac. Sci. Technol. A 47, 1289 (2009).
250. M. J. Kushner, " Hybrid Modeling of Low Temperature Plasmas for Fundamental Investigations and Equipment Design" (Invited) ", J. Phys. D 42, 194013 (2009).
251. M. Wang and M. J. Kushner, " High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics ", J. Appl. Phys 107, 023308 (2010).
252. M. Wang and M. J. Kushner, " High energy electron fluxes in dc-augmented capacitively coupled plasmas II. Effects on twisting in high aspect ratio etching of dielectrics ", J. Appl. Phys 107, 023309 (2010).
253. S. Kirk, M. Strobel, C-Y. Lee, S. J. Pachuta, M. Prokosch, H. Lechuga, M. E. Jones, Christopher S. Lyons, S. Degner, Y. Yang and M. J. Kushner " Fluorine Plasma Treatments of Polypropylene Films I: Surface Characterization ", Plasma Proc. Polymers 7, 107 (2010).
254. Y. Yang, S. Kirk, M. Strobel and M. J. Kushner " Fluorine Plasma Treatments of Polypropylene Films II: Modeling Reaction Mechanisms and Scaling ", Plasma Proc. Polymers 7, 123 (2010).
255. Y. Yang and M. J. Kushner " Graded Conductivity Electrodes as Means to Improve Plasma Uniformity in Dual Frequency Capacitively Coupled Plasma Sources ", J. Phys. D 43, 152001 (2010).
256. N. Yu. Babaeva and M. J. Kushner " Intracellular Electric Fields Produced by Dielectric Barrier Discharge Treatment of Skin ", J. Phys. D 43, 185206 (2010).
257. Y. Yang and M. J. Kushner " Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency ", Plasma Sources Sci. Technol. 19, 055011 (2010).
258. Y. Yang and M. J. Kushner " Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity ", Plasma Sources Sci. Technol. 19, 055012 (2010).
259. Y. Yang and M. J. Kushner " 450 mm Dual Frequency Capacitively Coupled Plasma Sources: Conventional, Graded and Segmented Electrodes ", J. Appl. Phys 108, 113306 (2010).
260. Z. Xiong and M. J. Kushner " Surface Corona-Bar Discharges for Production of Pre-ionizing UV Light for Pulsed High Pressure Plasmas ", J. Phys D 43, 505204 (2010).
261. B. S. Sommers, J. E. Foster, N. Yu Babaeva and M. J. Kushner " Observations of Electric Discharge Streamer Propagation and Capillary Oscillations on the Surface of Air Bubbles in Water ", J. Phys D 44, 082001 (2011).
262. N. Yu Babaeva and M. J. Kushner " Ion energy and angular distributions onto polymer surfaces delivered by dielectric barrier discharge filaments in air: I. Flat surfaces ", Plasma Source Sci. Technol. 20, 035017 (2011).
263. N. Yu Babaeva and M. J. Kushner " Ion energy and angular distributions onto polymer surfaces delivered by dielectric barrier discharge filaments in air: II. Particles ", Plasma Source Sci. Technol. 20, 035018 (2011).
264. J. Shoeb and M. J. Kushner " Mechanisms for sealing of porous low-k SiOCH by combined He and NH₃ plasma treatment ", J. Vac. Sci. Technol. A 29, 051305 (2011).
265. M. Wang and M. J. Kushner " Modeling of implantation and mixing damage during etching of SiO₂ over Si in fluorocarbon plasmas ", J. Vac. Sci. Technol. A 29, 051306 (2011).
266. K. Takashima, I. V. Adamovich, Z. Xiong, M. J. Kushner, S. Starikovskaia, U. Czarnetzki and D. Luggenholscher " Experimental and modeling analysis of fast ionization wave discharge propagation in a rectangular geometry ", Phys. Plasmas 18, 083505 (2011).
267. Z. Xiong, M. J. Kushner, " Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers ", J. Appl. Phys 110, 083304 (2011).
268. A. Wollny, T. Hemke, M. Gebhardt,R. P. Brinkmann, H. Boettner, J. Winter, V. Schulz-von der Gathen, Z. Xiong, M. J. Kushner and T. Mussenbrock, " Ionization wave propagation on a micro cavity plasma array ", Appl. Phys. Lett. 99, 141504 (2011).