Projects
This page contains links to current and past projects by the Computational Plasma Science and Engineering Group.
- The Charging Process of Rollers in Print Engines with Atmospheric Pressure Plasmas [Jerry Wang (08 August 2013)]
- Plasma Dynamics of Electric Discharges Sustained in Bubbles in Water: Images and Optical Spectra [Wei Tian (07 August 2013)]
- Atmospheric Pressure Ionization Waves Propagating Through a Flexible High Aspect Ratio Capillary Channel and Impinging upon a Target [Zhongmin Xiong (22 July 2013)]
- Dielectric Barrier Discharge Treatment of Skin [Natalie Babaeva (11 July 2012)]
- Plasma Etching of HfO2 Gate Stacks with Si Selectivity [Juline Shoeb (12 June 2009)]
- Branching and Structure of Streamers in Gases, Liquids and Gaseous Bubbles Immersed in Liquids [Natalie Babaeva (12 June 2009)]
- Penetration of Plasma Into the Wafer-Focus Ring Gap in Capacitively Coupled Plasmas [Natalie Babaeva (12 June 2009)]
- Numerical Investigation of Wave Effects in High Frequency Capacitively Coupled Plasmas [Yang Yang (21 February 2009)]
- Elimination of Twisting in High Aspect Ratio (HAR) SiO2 Etching in Fluorocarbon Plasmas - High Energy Electron (HEE) Effects [Mingmei Wang (21 February 2009)]
- 2-dimensional Modeling of Pulsed Inductively Coupled Plasmas [Pramod Subramonium (26 August 2003)]
- Non-equilibrium Ion and Neutral Transport in Low-pressure Plasma Processing Reactors [Vivek Vyas (26 August 2003)]
- Coulomb Crystals in Plasma Processing Reactors [Vivek Vyas (26 August 2003)]
- Global Modeling of Singlet-Delta Oxygen Production in Glow Discharges with Application to Oxygen-Iodine Lasers [D. Shane Stafford (26 August 2003)]
- Startup Processes in Metal Halide Lamps [Ananth Bhoj (26 August 2003)]
- Radiation Trapping in Electrodeless Lamps [Kapil Rajaraman (26 August 2003)]
- Harmonic Content of Electron Impact Source Functions in Inductively Coupled Plasmas using an "On-the-Fly" Monte Carlo Technique [Arvind Sankaran (26 August 2003)]
- Integrated Modeling: Etching and Post-processing of Porous and Conventional SiO2 in Fluorocarbon Plasmas [Arvind Sankaran (26 August 2003)]
- Hybrid Plasma Equipment Model: Inductively Coupled Plasma Etching Reactors
- Consequences of Asymmetric Pumping in an ICP Reactor
- Plasma Chemistry Monte Carlo Module
- Monte Carlo Feature Profile Model
- Studies in Nonlinear Plasma-Circuit Interaction
- Feedback Control of RF Plasma Processing Reactors (Updated 9/30/98)
- A Plasma Display Panel Simulation Code (Updated 9/30/98)
- Simulations of Remote AR/O2 and AR/N2 Plasmas for Oxide Growth and Interface Treatments
- Studies of Electron Cyclotron Resonance (ECR) Devices Sustained by Azimuthal Microwave TE(0,n) Mode Fields
- Magnetron Ionized Metal Physical Vapor Deposition
- Plasma Remediation of Greenhouse Gases in Semiconductor Processing
- Plasma Remediation of Toxic Gases in DBDs
- Plasma Transport Around Complex Dust Agglomerates
- Simulation of PECVD of SiO2 Film on Plastic Tubes
- Surface Reaction Modeling in Plasma Deposition and Etching Processing
- 3-Dimensional Plasma Equipment Simulation Using a New Ambipolar Accleration Technique