• Electrical Engineering and Computer Science
  • Michigan Institute for Plasma Science and Engineering

Publications

  1. M. J. Kushner and F. E. C. Culick, "Extrema of Electron Density and Output Pulse Energy in a CuCl/Ne Discharge and a Cu/CuCl Double Pulsed Laser ", Appl. Phys. Lett. 33, 728 (1978).
  2. M. J. Kushner and F. E. C. Culick, "A Continuous Discharge Improves the Performance of the Cu/CuCl Double Pulsed Laser", IEEE J. Quant. Elect. QE-15, 835 (1979).
  3. M. J. Kushner and F. E. C. Culick, "Characteristics of the Pumping Pulse and the Output Laser Pulse of a Cu/CuCl Double Pulsed Laser", J. Quant. Elect. QE-16, 677 (1980).
  4. M. J. Kushner and F. E. C. Culick, "A Model for the Dissociation Pulse, Afterglow, and Laser Pulse in the Cu/CuCl Double Pulsed Laser", J. Appl. Phys. 51, 3020 (1980).
  5. M. J. Kushner, "Characteristics of a UF6-H2/HF Nuclear Pumped Laser", J. Appl. Phys. 51, 2421 (1980).
  6. M. J. Kushner, W. M. Grossman and F. E. C. Culick, "Electron Collision Quenching of CO(v) Chemiluminescence in CS2/O2 and CS2/O2/N2O Flames", J. Appl. Phys. 52, 3776 (1981).
  7. M. J. Kushner, "A Self-Consistent Model for High Repetition Rate Copper Vapor Lasers", J. Quant. Elect. QE-17, 1555 (1981).
  8. M. J. Kushner, "A Kinetic Study of the Plasma Etching Process I: A Model for the Etching of Si and SiO2 in CnFm/H2 and CnFm/O2 Plasmas", J. Appl. Phys. 53, 2923 (1982). (ERRATA: J. Appl. Phys. 53, 6491 (1982)).
  9. M. J. Kushner, "A Kinetic Study of the Plasma Etching Process II: Probe Measurements of Electron Properties in an RF Plasma Etching Reactor ", J. Appl. Phys. 53, 2939 (1982).
  10. P. J. Hargis and M. J. Kushner, "Detection of CF2 Radicals in a Plasma Etching Reactor by KrF Laser-Induced-Fluorescence ", Appl. Phys. Lett. 40, 779 (1982).
  11. M. J. Kushner, "Probability Distributions for the Breakdown Voltage Between Closely Spaced Electrodes on Insulated Surfaces ", J. Appl. Phys. 53, 6731 (1982).
  12. M. J. Kushner, "A Nuclear-Reactor Pumped Laser Excited by Ion-Ion Neutralization ", J. Appl. Phys. 54, 39 (1983).
  13. W. G. Breiland and M. J. Kushner, "Pulsed UV Laser Raman Spectroscopy of Silane in a Linear-Flow Chemical Vapor Deposition Reactor ", Appl. Phys. Lett. 42, 395 (1983).
  14. M. J. Kushner and B. E. Warner, "Large Bore Copper Vapor Lasers: Kinetics and Scaling Issues ", J. Appl. Phys. 54, 2970 (1983).
  15. M. J. Kushner, "Optogalvanic Isotope Enrichment of Copper Ions in Cu-Ne Positive Column Discharges", Appl. Opt. 22, 1970 (1983).
  16. M. J. Kushner, "A Monte-Carlo Simulation of Electron Properties in Parallel Plate Capacitively Coupled RF Discharges " J. Appl. Phys. 54, 4958 (1983).
  17. M. J. Kushner, "Floating Sheath Potentials in Non-Maxwellian Plasmas, " IEEE Trans. Plasma Sci. PS-13, 6 (1985).
  18. M. J. Kushner, "Arc Expansion in Xenon Flashlamps," J. Appl. Phys. 57, 2486 (1985).
  19. M. J. Kushner, A. L. Pindroh, C. H. Fisher, T. A. Znotins and J. J.Ewing, "Multidimensional Modeling of Transverse Avalanche Laser Discharges: Applications to the HgBr Laser," J. Appl. Phys. 57, 2406 (1985).
  20. M. J. Kushner, W. D. Kimura and S. R. Byron, "Arc Resistance of Laser Triggered Spark Gaps," J. Appl. Phys. 58, 1744 (1985).
  21. M. J. Kushner, R. D. Milroy and W. D. Kimura, "A Laser Triggered Spark Gap Model," J. Appl. Phys. 58, 2988 (1985).
  22. D. Barrett, W. D. Kimura, M. J. Kushner, E. A. Crawford and S. R. Byron, "Low Inductance Capacitive Probe for Spark Gap Voltage Measurements," Rev. Sci. Instrum. 56, 2111 (1985).
  23. M. J. Kushner, W. D. Kimura, D. H. Ford and S. R. Byron, "Dual Arc Formation in a Laser Triggered Spark Gap," J. Appl. Phys. 58, 4015 (1985).
  24. M. J. Kushner, "Distribution of Ion Energies on Electrodes in Capacitively Coupled RF Discharges," J. Appl. Phys. 58, 4024 (1985).
  25. F. J. Kampas and M. J. Kushner, "Effect of Silane Pressure on Silane-Hydrogen RF Glow Discharges, " IEEE Trans. Plasma Sci. PS-14, 173 (1986).
  26. M. J. Kushner, "Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges, " IEEE Trans. Plasma Sci. PS-14, 188 (1986).
  27. W. D. Kimura, M. J. Kushner, E. A. Crawford and S. R. Byron, "Laser Interferometric Measurements of a Laser Preionization Triggered Spark Column, " IEEE Trans. Plasma Sci. PS-14, 246 (1986).
  28. C. H. Fisher, J. J. Ewing, T. E. Dehart, M. J. Kushner and J. McDaniels, "High Efficiency XeCl Laser Excitation with Magnetic Switching," Appl. Phys. Lett. 48, 1574 (1986).
  29. M. J. Kushner and A. L. Pindroh, "Discharge Constriction, Photodetachment, and Ionization Instabilities in E-Beam Sustained Discharge Excimer Lasers," J. Appl. Phys. 60, 904 (1986).
  30. M. J. Kushner, C. H. Fisher, J. Demboski, and R. A. Petr, "Performance of and Excited State Densities in a Linear Thyratron," J. Appl. Phys. 60, 2766 (1986).
  31. D. B. Harris, M. J. Kushner and others, "Future Developments and Applications of KrF Laser Fusion Systems," Fusion Technology 11, 705 (1987).
  32. M. J. Kushner, "Application of a Particle Simulation to Modeling Commutation in a Linear Thyratron," J. Appl. Phys. 61, 2784 (1987).
  33. J. M. Eggleston and M. J. Kushner, "Stimulated Brillouin Scattering Parasitics in Large Optical Windows," Optics Lett. 12, 410 (1987).
  34. M. J. Kushner, "Discharge Instabilities Initiated by Nonuniform Laser Extraction in E-Beam Sustained Discharge KrF Lasers," J. Appl. Phys. 62, 101 (1987).
  35. G. Hebner and M. J. Kushner, "The Phase and Energy Distribution of Ions Incident on Electrodes in Radio Frequency Discharges," J. Appl. Phys. 62, 2256 (1987).
  36. M. J. Kushner, "On the Balance Between Silyl and Silylene Radicals in RF Glow Discharges in Silane: The Effect on Deposition Rates of a-Si:H," J. Appl. Phys. 62, 2803 (1987).
  37. M. J. Kushner, "A Phenomenological Model for the Surface Deposition Kinetics During Plasma and Sputter Deposition of Amorphous Silicon," J. Appl. Phys. 62, 4763, (1987).
  38. G. A. Hebner, J. T. Verdeyen, and M. J. Kushner, "An Experimental Study of a Parallel Plate Radio Frequency Discharge: Measurements of the Radiation Temperature and Electron Density", J. Appl. Phys. 63, 2226 (1988).
  39. W. D. Kimura, M. J. Kushner, and J. Seamans, "Characteristics of a Laser Triggered Spark Gap Using Air, Ar, CH4, H2, He, N2, SF6, and Xe", J. Appl. Phys. 63, 1882 (1988).
  40. T. J. Moratz and M. J. Kushner, "Fission Fragment Pumping of a Neon Plasma", J. Appl. Phys. 63, 1796 (1988).
  41. M. J. Kushner, "A Model for the Discharge Kinetics and Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon", J. Appl. Phys. 63, 2532 (1988).
  42. M. J. Kushner and T. J. Moratz, "Direct Dissociation of F2 in Electron Beam Pumped Excimer Lasers: The Effect on Electron Density", Appl. Phys. Lett. 52, 1856 (1988).
  43. T. J. Moratz, T. D. Saunders and M. J. Kushner, "Heavy Ion vs Electron Beam Excitation of an Excimer Laser", J. Appl. Phys. 64, 3799 (1988).
  44. T. L. Peck and M. J. Kushner, "Townsend Transport Coefficients for Surface Flashover Discharges", J. Appl. Phys. 64, 4404 (1988).
  45. M. J. McCaughey and M. J. Kushner, "Simulation of the Bulk and Surface Properties of Hydrogenated Amorphous Silicon Deposited from Silane Plasmas", J. Appl. Phys. 65, 186 (1989).
  46. T. J. Moratz, T. D. Saunders, and M. J. Kushner, "High Temperature Kinetics in He and Ne Buffered XeF Lasers: The Effect on Absorption", Appl. Phys. Lett. 54, 102 (1989).
  47. M. J. McCaughey and M. J. Kushner, "Production of Disilane and Silyl Sticking Coefficients During Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon", Appl. Phys. Lett. 54, 1642 (1989).
  48. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, "Cylindrical Magnetron Discharges: I. Current-Voltage Characteristics for dc and rf Driven Discharge Sources", J. Appl. Phys. 65, 3816 (1989).
  49. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, "Cylindrical Magnetron Discharges: II. The Formation of dc Bias in rf Driven Discharge Sources", J. Appl. Phys. 65, 3825 (1989).
  50. M. Ohwa and M. J. Kushner, "The Effects of Ground State Dynamics on the Emission Spectra of Electric Discharge Pumped XeCl Lasers: A Model for Injection Locking", J. Appl. Phys. 65, 4138 (1989).
  51. G. Y. Yeom and M. J. Kushner, "Magnetic Field Effects on Cylindrical Magnetron Reactive Ion Etching of Si/SiO2 in CF4 and CF4/H2 Plasmas", J. Vac. Sci. Tech. A 7, 987 (1989).
  52. M. Pinarbasi, N. Maley, L. H. Chou, A. Myers, M. J. Kushner, J. R. Abelson and J. A. Thornton, "Effect of Hydrogen on the Microstructural, Optical and Electronic Properties of a-Si:H Thin Films Deposited by DC Magnetron Reactive Sputtering", J. Vac. Sci. Tech. A 7, 1210 (1989).
  53. M. J. Kushner, "Response Times and Energy Partitioning in Electron Beam Excited Plasmas", J. Appl. Phys. 66, 2297 (1989).
  54. H. Pak and M. J. Kushner, "Simulation of the Switching Performance of an Optically Triggered Psuedo-Spark Thyratron", J. Appl. Phys. 66, 2325 (1989).
  55. M. J. McCaughey and M. J. Kushner, "Electron Transport in Dusty Argon Plasmas", Appl. Phys. Lett. 55, 951 (1989).
  56. M. Ohwa, T. J. Moratz and M. J. Kushner, "Excitation Mechanisms of the Electron Beam Pumped Atomic Xenon (5d   6p) Laser", J. Appl. Phys. 66, 5131 (1989).
  57. J. V. DiCarlo and M. J. Kushner, "Solving the Spatially Dependent Boltzmann's Equation for the Electron Velocity Distribution Using Flux Corrected Transport", J. Appl. Phys. 66, 5763 (1989).
  58. M. J. Kushner, D. E. Hanson and B. I. Schneider, "Reassessment of the Rate Coefficient for Electron Collision Quenching of KrF(B)", Appl. Phys. Lett. 55, 2482 (1989).
  59. L. E. Kline and M. J. Kushner, "Computer Simulations of Materials Processing Plasma Discharges", in CRC Critical Reviews in Solid State and Materials Science, Vol. 16, (CRC Press, Florida 1989), pp. 1-35).
  60. G. Y. Yeom and M. J. Kushner, "Si/SiO2 Etch Properties Using CF4 and CHF3 in Cylindrical Magnetron Discharges", Appl. Phys. Lett. 56, 857 (1990).
  61. M. Pinarbasi, J. R. Abelson and M. J. Kushner, "Reduced Staebler-Wronski Effect in Reactively Sputtered Amorphous Silicon Thin Films", Appl.Phys. Lett. 56, 1685 (1990).
  62. M. Pinarbasi, M. J. Kushner and J. R. Abelson, "Electronic Stability of the Reactively Sputtered Hydrogenated Silicon Thin Films: The Effect of Hydrogen Content", J. Vac. Sci. Tech. A 8, 1369 (1990).
  63. M. Pinarbasi, J. R. Abelson and M. J. Kushner, "Effect of Hydrogen Content on the Light Induced Defect Generation in Direct Current Magnetron Reactively Sputtered Amorphous Silicon Thin Films", J. Appl. Phys. 68, 2255 (1990).
  64. H. Pak and M. J. Kushner, "A Multi-Beam-Bulk Model for Electron Transport During Commutation in an Optically Triggered Pseudospark Thyratron", Appl. Phys. Lett. 57, 1619 (1990).
  65. M. J. Kushner, "Return Currents in Large Aperture Electron Beam Excited KrF Lasers", IEEE J. Quant. Electron. 26, 1546-1554 (1990).
  66. M. Ohwa and M. J. Kushner, "Energy Loading Effects in Scaling the Atomic Xenon Laser", IEEE J. Quant. Electron. 26, 1639-1646 (1990).
  67. P. J. Peters, Y. F. Lan, M. Ohwa and M. J. Kushner, "Impact of Electron Collision Mixing on the Delay Times of an Electron Beam Excited Atomic Xenon Laser", J. Quant. Electron. 26, 1964-1970 (1990).
  68. Y. Weng and M. J. Kushner, "A Method for Including Electron-Electron Collisions in Monte Carlo Simulations of Electron Swarms in Partially Ionized Plasmas", Phys. Rev. A. 42, 6192 (1990).
  69. M. J. Kushner, "Microarcs as a Termination Mechanism of Optical Pulses in Electric Discharge Excited KrF Lasers", Trans. Plasma Science19, 387 (1991).
  70. M. J. Kushner and D. B. Graves, "Guest Editorial", Special Issue of Transactions on Modeling Collisional Low Temperature Plasmas, IEEE Trans. Plasma Science 19, 63 (1991).
  71. G. N. Hays, W. J. Alford, M. Ohwa and M. J. Kushner, "The Effects of He Addition on the Performance of the Fission Fragment Excited Ar/Xe Atomic Xenon Laser", J. Appl. Phys. 69, 1843 (1991).
  72. M. B. Chang, J. H. Balbach, M. J. Rood and M. J. Kushner, "Removal of SO2 from Gas Streams Using a Dielectric Barrier Discharge", J. Appl. Phys. 69, 4409 (1991).
  73. M. J. McCaughey and M. J. Kushner, "A Model for Particulate Contaminated Glow Discharges", J. Appl. Phys. 69, 6952 (1991).
  74. T. J. Sommerer and M. J. Kushner, "Translationally Hot Neutrals in Etching Discharges", J. Appl. Phys. 70, 1240 (1991).
  75. H. Hwang, R. Hui, K. James and M. J. Kushner, "Fluorocarbon Impurities in E-Beam Excited KrF Lasers", J. Appl. Phys. 69, 7419 (1991).
  76. T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey and M. J. Kushner, "Monte Carlo Fluid Hybrid Model of the Accumulation of Dust Particles at Sheath Edges in Radio Frequency Discharges", Appl. Phys. Lett. 59, 638 (1991).
  77. S. J. Choi, M. J. McCaughey, T. J. Sommerer and M. J. Kushner, "Perturbation of the Cathode Fall in dc Glow Discharges by Particulate Contamination", Appl. Phys. Lett. 59, 3102 (1991).
  78. H. Pak and M. J. Kushner, "Breakdown Characteristics in Nonplanar Geometries and Hollow Cathode Pseudospark Switches", J. Appl. Phys. 71, 94 (1992).
  79. A. Garscadden, M. J. Kushner and J. G. Eden, "Partially Ionized Plasma Physics and Gas Discharge Lasers", IEEE Transactions on Plasma Science 19, 1013 (1991).
  80. M. B. Chang, M. J. Kushner and M. J. Rood, "Gas Phase Removal of NO from Gas Streams via Dielectric Barrier Discharges", Environmental Science and Technology 26, 777 (1992).
  81. T. J. Sommerer and M. J. Kushner, "Numerical Investigation of the Kinetics and Chemistry of rf Glow Discharge Plasmas Sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 Using a Monte Carlo-Fluid Hybrid Model", J. Appl. Phys. 71, 1654 (1992).
  82. M. J. Kushner, "Simulation of the Gas Phase Processes in Remote Plasma Activated Chemical Vapor Deposition of Silicon Dielectrics Using Rare Gas-Silane-Ammonia Mixtures", J. Appl. Phys. 71, 4173 (1992).
  83. Y. Weng and M. J. Kushner, "Electron Energy Distributions in Electron Cyclotron Resonance Discharges for Materials Processing", J. Appl. Phys. 72, 33 (1992).
  84. T. J. Sommerer, H. Pak and M. J. Kushner, "Cathode Heating Mechanisms in Pseudospark (Back-Lighted Thyratron) Plasma Switches", J. Appl. Phys. 72, 3374 (1992).
  85. T. J. Sommerer and M. J. Kushner, "A Monte Carlo-Fluid Model of Chlorine Atom Production in Cl2, HCl and CCl4 Radio Frequency Discharges for Plasma Etching", J. Vac. Sci. Tech. B 10, 2179 (1992).
  86. M. B. Chang, M. J. Kushner and M. J. Rood, "Removal of SO2 and Simultaneous Removal of SO2 and NO from Simulated Flue Gas Streams via Dielectric Barrier Discharge Plasmas", Plasma Chemistry and Plasma Processing 12, 565 (1992).
  87. M. B. Chang, M. J. Kushner and M. J. Rood, "Removal of SO2and NO from Gas Streams with Combined Plasma Photolysis ", J. Environmental Engr. 119, 414 (1993).
  88. M. Hartig and M. J. Kushner, "Radially Dependent Solutions of Boltzmann's Equation Using a Modified 2-Term Spherical Harmonic Expansion", J. Appl. Phys. 73, 1080 (1993).
  89. D. G. Storch and M. J. Kushner, "Destruction Mechanisms for Formaldehyde in Atmospheric Pressure Low Temperature Plasmas", J. Appl. Phys. 73, 51 (1993).
  90. J. W. Shon, M. J. Kushner, G. A. Hebner and G. N. Hays, "Predictions for Gain in the Fission Fragment Excited Atomic Xenon Laser", J. Appl. Phys. 73, 2686 (1993).
  91. M. J. Hartig and M. J. Kushner, "A Monte Carlo-Hydrodynamic Simulation of Neutral Radical Transport in Low Pressure Remote Plasma Activated Chemical Vapor Deposition", Appl. Phys. Lett. 62, 1594 (1993).
  92. P. J. Hargis, M. J. Kushner and 27 other authors, "The GEC RF Reference Cell: A Defined Parallel-Plate Radio-Frequency System for Experimental and Theoretical Studies of Plasma-Processing Discharges", Reviews of Scientific Instruments 65, 140 (1994).
  93. M. J. Kushner, "Pulsed Plasma-Pulsed Injection Sources for Remote Plasma Activated Chemical Vapor Deposition", J. Appl. Phys. 73, 4098 (1993).
  94. S. J. Choi and M. J. Kushner, "The Role of Negative Ions in the Formation of Particles in Low Pressure Plasmas", J. Appl. Phys. 74, 853 (1993).
  95. P. J. Stout and M. J. Kushner, "A Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of SiO2 using O2/TEOS Chemistry", J. Vac. Sci. Tech. A 11, 2562 (1993).
  96. S. J. Choi and M. J. Kushner, "A Simulation of the Shielding of Dust Particles in Low Pressure Glow Discharges: Electron-Dust and Ion-Dust Particle Cross Sections", Appl. Phys. Lett. 62, 2197 (1993).
  97. J. W. Shon, R. L. Rhoades, J. T. Verdeyen and M. J. Kushner, "Short Pulse Electron Beam Excitation of the High Pressure Atomic Ne Laser", J. Appl. Phys. 73, 8059 (1993).
  98. P. L. G. Ventzek, R. J. Hoekstra, T. J. Sommerer and M. J. Kushner, "A 2-dimensional Hybrid Model of Inductively Coupled Plasma Sources for Etching", Appl. Phys. Lett. 63, 605 (1993).
  99. D. Evans, L. A. Rosocha, G. K. Anderson, J. J. Coogan, and M. J. Kushner, "Plasma Remediation of Trichloroethylene in Silent Discharge Plasmas", J. Appl. Phys. 74, 5378 (1993).
  100. M. J. Kushner, "Plasma Chemistry of He/SiH4/O2/N2O Mixtures for Remote Plasma Activated Chemical Vapor Deposition of Silicon Dioxide", J. Appl. Phys. 74, 6538 (1993).
  101. G. A. Hebner, J. W. Shon and M. J. Kushner, "Temperature Dependent Gain in the Atomic Xe Laser", Appl. Phys. Lett. 63, 2872 (1993).
  102. H. H. Hwang and M. J. Kushner, "Ion Energy Distributions in rf Discharges Sustained in Gas Mixtures Obtained Using a Monte Carlo-Fluid Hybrid Model: Endothermic Processes and Ion Holes", Plasma Sources Sci. Technol. 3, 190 (1994).
  103. S. J. Choi and M. J. Kushner, "A Particle-in-Cell Simulation of Dust Charging and Shielding in Low Pressure Glow Discharges", IEEE Trans. Plasma Science 22, 138 (1994).
  104. J. W. Shon and M. J. Kushner, "Excitation Mechanisms and Gain Modeling of the High Pressure Ar Laser in He/Ar Mixtures", J. Appl. Phys. 75, 1883 (1994).
  105. P. L. G. Ventzek, R. J. Hoekstra, M. J. Kushner, "2-Dimensional Modeling of High Plasma Density Inductively Coupled Sources for Materials Processing", J. Vac. Sci. Tech. B. 12, 461 (1994).
  106. S. J. Choi and M. J. Kushner, "Mutual Shielding of Closely Spaced Dust Particles in Low Pressure Plasmas", J. Appl. Phys. 75, 3351 (1994).
  107. J. L. Shohet, E. B. Wickesberg, and M. J. Kushner, "Computer Simulation of Mass-Selective Plasma-Source Ion Implantation", J. Vac. Sci. Technol. A. 12, 1380 (1994).
  108. S. J. Choi, P. L. G. Ventzek, R. J. Hoekstra and M. J. Kushner, "Spatial Distributions of Dust Particles in Plasmas Generated by Capacitively Coupled Radio Frequency Discharges", Plasma Sources Sci. Technol. 3, 418 (1994).
  109. P. L. G. Ventzek, M. Grapperhaus and M. J. Kushner, "Investigation of Electron Source and Ion Flux Uniformity in High Plasma Density Inductively Plasma Tools Using 2-dimensional Modeling", J. Vac. Science Tech. B 12, 3118 (1994).
  110. P. J. Stout and M. J. Kushner, "Characteristics of an Optically Activated Pulsed Power GaAs(Si:Cu) Switch Obtained by 2-dimensional Modeling", J. Appl. Phys. 77, 3518 (1995).
  111. R. J. Hoekstra and M. J. Kushner, "The Effect of Sub-wafer Dielectrics on Plasma Properties in Plasma Etching Reactors", J. Appl. Phys. 77, 3668 (1995).
  112. A. C. Gentile and M. J. Kushner, "Plasma Remediation of Perchloroethylene (PCE) in Humid Gas Streams", J. Appl. Phys. 78, 2977 (1995).
  113. A. C. Gentile and M. J. Kushner, "Reaction Chemistry and Optimization of Plasma Remediation of NxOy from Gas Streams", J. Appl. Phys. 78, 2074 (1995).
  114. F. Y. Huang and M. J. Kushner, "A Hybrid Model for Particle Transport and Electron Energy Distributions in Positive Column Discharges Using Equivalent Species Transport", J. Appl. Phys. 78, 5909 (1995).
  115. H. H. Hwang, J. K. Olthoff, R. J. Van Brunt, S. B. Radovanov, and M. J. Kushner, "Evidence for Inelastic Processes for N3+ and N4+from Ion Energy Distributions in He/N2 rf Glow Discharges", J. Appl. Phys. 79, 93 (1996).
  116. M. J. Kushner and D. N. Ruzic, "Guest Editorial: Speical Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 24, 4 (1996).
  117. W. Z. Collison and M. J. Kushner, "Conceptual Design of Advanced Inductively Coupled Plasma Etching Tools Using Computer Modeling ", Trans. Plasma Sci. 24, 135 (1996).
  118. P. J. Stout and M. J. Kushner, "Modeling of High Power Semiconductor Switches Operated in the Non-linear Mode", J. Appl. Phys. 79, 2084 (1996).
  119. R. J. Hoekstra and M. J. Kushner, "Predictions of Ion Energy Distributions and Radical Fluxes in rf Biased Inductively Coupled Plasma Etching Reactors", J. Appl. Phys. 79, 2275 (1996).
  120. W. Z. Collison and M. J. Kushner, "Ion Drag Effects in Inductively Coupled Plasmas for Etching", Appl. Phys. Lett. 68, 903 (1996).
  121. A. C. Gentile and M. J. Kushner, "Microstreamer Dynamics During Plasma Remediation of NxOy in Dielectric Barrier Discharges", J. Appl. Phys. 79, 3877 (1996).
  122. F. Y. Huang, H. H. Hwang and M. J. Kushner, "A Model for Transport and Agglomeration of Particles in Reactive Ion Etching Plasma Reactors:" , J. Vac. Sci. Technol. A 14, 562 (1996).
  123. W. Tan, R. J. Hoekstra and M. J. Kushner, "A Time Dependent Propagator Method for Long Mean Free Path Transport of Neutral Particles in Plasma Processing Reactors", J. Appl. Phys. 79, 3423 (1996).
  124. A. C. Gentile and M. J. Kushner, "The Effect of CO2 on the Plasma Remediation of NxOy", Appl. Phys. Lett. 68, 2064 (1996).
  125. M. J. Kushner, W. Z. Collison and D. N. Ruzic, "Electron-Beam Sustained Radio Frequency Discharges for Plasma Processing", J. Vac. Sci. Technol. A 14, 2094 (1996).
  126. H. H. Hwang and M. J. Kushner, "Regimes of Particle Trapping in Inductively Coupled Plasma Processing Reactors", Appl. Phys. Lett. 68, 3716 (1996).
  127. M. J. Kushner, W. Z. Collison, M. J. Grapperhaus, J. P. Holland and M. S. Barnes, "A 3-dimensional Model for Inductively Coupled Plasma Etching Reactors: Azimuthal Symmetry and Coil Properties", J. Appl. Phys. 80, 1337 (1996).
  128. I. Peres and M. J. Kushner, "Spatial Distributions of Power and Ion Densities in rf Excited Remote Plasma Reactors", Plasma Sources Sci. Technol. 5, 499 (1996).
  129. P. N. Barnes and M. J. Kushner, "Formation of XeI(B) in Low Pressure Inductive Radio Frequency Discharges Sustained in Mixtures of Xe and I2", J. Appl. Phys. 80, 5593 (1996).
  130. M. J. Grapperhaus and M. J. Kushner, "A Semi-Analytic Sheath Model Integrated into a 2-dimensional Model for Radio Frequency Biased, Inductively Coupled Plasma Etching Reactors", J. Appl. Phys.81, 569 (1997).
  131. R. J. Hoekstra, M. J. Grapperhaus and M. J. Kushner, "An Integrated Plasma Equipment Model for Polysilicon Etch Profiles in an Inductively Coupled Plasma Reactor with Subwafer and Super wafer Topography", J. Vac. Sci. Technol. A. 15, 1913 (1997).
  132. F. Y. Huang and M. J. Kushner, "Shapes of Agglomerates in Plasma Etching Reactors", J. Appl. Physics. 81, 5960 (1997).
  133. S. Rauf and M. J. Kushner, "A Model for Non-Collisional Heating in Inductively Coupled Plasma Processing Sources", J. Appl. Phys. 81, 5966 (1997).
  134. H. H. Hwang and M. J. Kushner, "Simulation of the Formation of Coulomb Liquids and Solids in Dusty Plasmas", J. Appl. Phys. 82, 2106 (1997).
  135. P. N. Barnes and M. J. Kushner, "Ion-ion Neutralization of Iodine in rf Inductive Discharges of Xe and I2 Mixtures", J. Appl. Phys. 82, 2150 (1997).
  136. S. Rauf and M. J. Kushner, "A Self Consistent Analytical Model for Non-Collisional Heating in Low Pressure Plasmas", Plasma Sources Sci. Technol. 6, 518 (1997).
  137. S. Rauf and M. J. Kushner, "Argon Metastable Densities in Radio Frequency Ar, Ar/O2 and Ar/CF4 Electrical Discharges", J. Appl. Phys. 82, 2805 (1997).
  138. M. J. Kushner, "Consequences of Asymmetric Pumping in Low Pressure Plasma Processing Reactors: A 3-dimensional Modeling Study", J. Appl. Phys. 82, 5312 (1997).
  139. M. J. Grapperhaus, Z. Krivokapic and M. J. Kushner, "Design Issues in Ionized Metal Physical Vapor Deposition of Copper", J. Appl. Phys. 83, 35 (1998).
  140. S. Rauf and M. J. Kushner, "Virtual Plasma Equipment Model: A Tool for Investigating Feedback Control in Plasma Processing Equipment", IEEE Trans. Semiconductor Manufact. 11, 486 (1998).
  141. S. Rauf and M. J. Kushner, "The Effect of Radio Frequency Plasma Processing Reactor Circuitry on Plasma Characteristics", J. Appl. Phys. 83, 5087 (1998).
  142. E. R. Keiter and M. J. Kushner, "Plasma Transport Around Dust Particles Having Complex Shapes", J. Appl. Phys. 83, 5670 (1998).
  143. H. H. Hwang, E. R. Keiter and Mark J. Kushner, "Consequences of 3-dimensional Physical and Electromagnetic Structures on Dust Particle Trapping in High Plasma Density Material Processing Discharges",J. Vac. Sci. Technol. A.16, 2454 (1998).
  144. R. J. Hoekstra and M. J. Kushner, "Microtrenching Resulting from Specular Reflection During Chlorine Etching of Silicon", in J. Vac. Sci. Technol. B, 16, 2102 (1998).
  145. R. J. Hoekstra and M. J. Kushner, "Comparison of 2-d and 3-d Models for Profile Simulation of poly-Si Etching: When is a 3-d Model Required?",J. Vac. Sci. Techol. A, 16, 3274 (1998).
  146. X. Xu and M. J. Kushner, "Ion Composition of Expanding Microdischarges in Dielectric Barrier Discharges", J. Appl. Phys. 83, 7522 (1998).
  147. X. Xu and M. J. Kushner, "Multiple Microdischarge Dynamics Dielectric Barrier Discharges", J. Appl. Phys. 84, 4153 (1998).
  148. P. N. Barnes and M. J. Kushner, "Reactions in the Afterglow of Time Modulated Inductive Discharges of Xe and I2 Mixtures", J. Appl. Phys. 84, 4727 (1998).
  149. S. Rauf and M. J. Kushner, "Diagnostic Technique for Measuring Plasma Parameters Near Surfaces in Radio Frequency Discharges", Appl. Phys. Lett. 73, 2730 (1998).
  150. S. Rauf and M. J. Kushner, "Dynamics of a Coplanar-Electrode Plasma Display Panel Cell. I. Basic Operation", J. Appl. Phys. 85, 3460 (1999).
  151. S. Rauf and M. J. Kushner, "Dynamics of a Coplanar-Electrode Plasma Display Panel Cell. II. Cell Optimization", J. Appl. Phys. 85, 3470 (1999).
  152. S. Rauf and M. J. Kushner, "Controller Design Issues in the Feedback Control of Radio Frequency Plasma Processing Reactors", J. Vac. Sci. Technol. A 17, 704 (1999).
  153. S. Rauf and M. J. Kushner, "Operation of a Coplanar-Electrode Plasma Display Panel Cell", IEEE Trans. Plasma Sci. 27, 10 (1999).
  154. E. Keiter and M. J. Kushner, "Radical and Electron Densities in a High Plasma Density-Chemical Vapor Deposition Reactor from a Three-Dimensional Simulation", IEEE Trans. Plasma Sci. 27, 62 (1999).
  155. R. L. Kinder and M. J. Kushner, "TE01 Excitation of an Electron Cyclotron Resonance Plasma Source",IEEE Trans. Plasma Sci. 27, 64 (1999).
  156. X. Xu and M. J. Kushner, "The Consequences of Remnant Surface Charges on Microdischarges Spreading in Dielectric Barrier Discharges", IEEE Trans. Plasma Sci. 27, 108 (1999).
  157. M. J. Kushner and S. Rauf, "Guest Editorial: Second Triennual Special Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 27, 4 (1999).
  158. R. L. Kinder and M. J. Kushner, "Consequences of Mode Structure on Plasma Properties in Electron Cyclotron Resonance Sources", J. Vac. Sci. Technol. A 17, 2421 (1999).
  159. S. Rauf and M. J. Kushner, "Nonlinear Dynamics of Radio Frequency Plasma Processing Reactors Powered by Multifrequency Sources", Trans. Plasma Sci. 27, 1329 (1999).
  160. R. Dorai and M. J. Kushner, "Effect of Propene on the Remediation of NOx from Engine Exhausts", in "Non-Thermal Plasma for Exhaust Emission Control: NOx, HC, and Particulates [SP-1483]", (Society of Automotive Engineeers, PA, 1999).
  161. X. Xu, S. Rauf and M. J. Kushner, "Plasma Abatement of Perfluorocompounds in Inductively Coupled Plasma Reactors", J. Vac. Sci. Techol. A, 18, 213 (2000).
  162. D. Zhang and M. J. Kushner, "Surface Kinetics and Plasma Equipment Model for Si Etching by Fluorocarbon Plasmas", J. Appl. Phys. 87, 1060 (2000).
  163. T. van der Straaten and M. J. Kushner, "A Monte-Carlo Model of Xenon Resonance Radiation Transport in a Plasma Display Panel Cell: Transition from Optically Thick to Thin regimes", J. Appl. Phys. 87, 2700 (2000).
  164. J. Lu and M. J. Kushner, "Effect of Sputter Heating in Ionized Metal Physical Vapor Deposition Reactors", J. Appl. Phys. 87, 7198 (2000).
  165. M. J. Kushner and D. Zhang, "An Electron Impact Cross Section Set for CHF3", J. Appl. Phys. 88, 3231 (2000).
  166. R. Dorai and M. J. Kushner, "Consequences of Propene and Propane on Plasma Remediation of NOx", J. Appl. Phys. 88, 3739 (2000).
  167. R. Dorai, K. Hassouni and M. J. Kushner, "Interaction Between Soot Particles and NOx During Dielectric Barrier Discharge Plasma Remediation of Simulated Diesel Exhaust", J. Appl. Phys. 88, 6060 (2000).
  168. D. Zhang and M. J. Kushner, "Mechanisms for CF2 Radical Generation and Loss on Surfaces in Fluorocarbon Plasmas", J. Vac. Sci. Technol. A 18, 2661 (2000).
  169. J. Lu and M. J. Kushner, "Inflight Electron Impact Excitation in Ionized Metal Physical Vapor Deposition", J. Appl. Phys. 89, 878 (2001).
  170. R. Kinder and M. J. Kushner, "Wave Propagation and Power Deposition in Magnetically Enhanced Inductively Coupled and Helicon Plasma Sources", J. Vac. Sci. Technol. A 19, 76 (2001).
  171. R. Dorai and M. J. Kushner, "Effect of Multiple Pulses on the Plasma Chemistry During the Remediation of NOx Using Dielectric Barrier Discharges", J. Phys. D 34, 574 (2001).
  172. D. Zhang and M. J. Kushner, "Investigation of Surface Reactions During C2F6 Plasma Etching of SiO2 with Equipment and Feature Scale Models", J. Vac. Sci. Technol. A 19, 524 (2001).
  173. M. J. Kushner, "Core Values and the New Business Model", ASEE Prism 10, 65 (2001).
  174. J. Lu and M. J. Kushner, "Sources of Azimuthal Asymmetries in Ionized Metal Physical Vapor Deposition Processes", Plasma Sources Sci. Technol. 10, 502 (2001).
  175. J. Lu and M. J. Kushner, "Trench Filling by Ionized Metal Physical Vapor Deposition", J. Vac. Sci. Technol. A 19, 2652 (2001).
  176. P. Subramonium and M. J. Kushner, "Pulsed Inductively Coupled Chlorine Plasmas in the Presence of a Substrate Bias", Appl. Phys. Lett. 79, 2145 (2001).
  177. R. Kinder and M. J. Kushner, "Non-Collisional Heating and Electron Energy Distributions in Magnetically Enhanced Inductively Coupled and Helicon Plasma Sources", J. Appl. Phys. 90, 3699 (2001).
  178. P. Subramonium and M. J. Kushner, "Two-dimensional Modeling of Long-term Transients in Inductively Coupled Plasmas using Moderate Computational Parallelism. I. Ar Pulsed Plasmas", J. Vac. Sci. Technol. A 20, 313 (2002).
  179. P. Subramonium and M. J. Kushner, "Two-dimensional Modeling of Long-term Transients in Inductively Coupled Plasmas using Moderate Computational Parallelism. II. ArCl2 Pulsed Plasmas", J. Vac. Sci. Technol. A 20, 325 (2002).
  180. V. Vyas and M. J. Kushner, "Formation of Coulomb Crystals in a Capacitively Coupled Plasma", Trans. Plasma Science 30, 92 (2002).
  181. R. Kinder and M. J. Kushner, "Three-Dimensional Fields and Temperatures in a Squat Helicon Reactor", Trans. Plasma Science 30, 134 (2002).
  182. B. Lay, S. Rauf and M. J. Kushner, "Gap Closure in a Cold Metal Halid Lamp", Trans. Plasma Science 30, 190 (2002).
  183. M. J. Kushner, "Guest Editorial: Special Issue of the IEEE Transactions on Plasma Science: 3rd Triennial Issue on Images in Plasma Science", Trans. Plasma Science 30, 5 (2002).
  184. A. Sankaran and M. J. Kushner, "Harmonic Content of Electron Impact Source Functions in Inductively Coupled Plasmas Using an "On-the-Fly" Monte Carlo Technique", J. Appl. Phys. 92, 736 (2002).
  185. T. J. Pricer, M. J. Kushner and R. C. Alkire, "Monte Carlo Simulation of the Electrodeposition of Copper I. Additive-Free Acidic Sulfate Solution ", J. Electrochem. Soc. 149, c396 (2002).
  186. T. J. Pricer, M. J. Kushner and R. C. Alkire, "Monte Carlo Simulation of the Electrodeposition of Copper II. Acid Sulfate Solution with Blocking Additive ", J. Electrochem. Soc. 149, c406 (2002).
  187. V. Vyas, G. A. Hebner and M. J. Kushner, "A Self-consistent Three-dimensional Model of Dust Particle Transport and Formation of Coulomb Crystals in Plasma Processing Reactors ", J. Appl. Phys. 92, 6451 (2002).
  188. R. Dorai and M. J. Kushner, "Repetitively Pulsed Plasma Remediation of NOx in Soot Laden Exhaust ", J. Phys. D 35, 2954 (2002).
  189. Alex V. Vasenkov and Mark J. Kushner, "Electron Energy Distributions and Anomalous Skin Depth Effects in High-Plasma-Density Inductively Coupled Discharges ", Phys. Rev. E 66, 066411 (2002).
  190. Brian Lay, Richard S Moss, Shahid Rauf and Mark J. Kushner, "Breakdown Processes in Metal Halide Lamps ", Plasma Sources Science Technology 12, 8 (2003).
  191. Rajesh Dorai and Mark J. Kushner, "A Model for Plasma Modification of Polypropylene Using Atmospheric Pressure Discharges", J. Phys. D 36, 666 (2003).
  192. Arvind Sankaran and Mark J. Kushner, "Fluorocarbon Plasma Etching and Profile Evolution of Porous Low-dielectric-constant Silica", Appl. Phys. Lett. 82, 1824 (2003).
  193. M. Strobel, V. Jones, C. S. Lyons, M. Ulsh, M. J. Kushner, R. Dorai, and M. C. Branch, "A Comparison of Corona-treated and Flame-treated Polypropylene Films ", Plasmas and Polymers 8, 61 (2003).
  194. J. Hoard, T. J. Wallington, R. L. Bretz, A. Malkin, R. Dorai, and M. J. Kushner, "Importance of O(3P) Atoms and OH Radicals in Hydrocarbon Oxidation during the Non-thermal Plasma Treatment of Diesel Exhaust Inferred using Relative Rate Methods", Int. J. Chem. Kinetics 35, 231 (2003).
  195. R. Dorai and M. J. Kushner, "Consequences of unburned hydrocarbons on microstreamer dynamics and chemistry during plasma remediation of NOx using dielectric barrier discharges", J. Phys. D 36, 1075 (2003).
  196. M. J. Kushner, "Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Ar Discharges", J. Appl. Phys. 94, 1436 (2003).
  197. A. V. Vasenkov and M. J. Kushner, "Harmonic Content and Time Variation of Electron Energy Distributions in High-plasma-density, Low-pressure Inductively Coupled Discharges", J. Appl. Phys. 94, 2223 (2003).
  198. R. L. Kinder, A. R. Ellingboe and M. J. Kushner, "H- to W-mode Transitions and Properties of a Multimode Helicon Plasma Reactor", Plasma Sources Sci. Technol. 12, 561 (2003).
  199. D. B. Graves and M. J. Kushner, "Influence of Modeling and Simulation on the Maturation of Plasma Technology: Feature Evolution and Reactor Design", J. Vac. Sci. Technol. A 21, s152 (2003).
  200. A. V. Vasenkov and M. J. Kushner, "Angular Anisotropy of Electron Energy Distributions in Inductively Coupled Plasmas", J. Appl. Phys. 94, 5522 (2003).
  201. A. V. Vasenkov and M. J. Kushner, "Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Ar / C4F8 / O2 discharges", J. Appl. Phys. 95, 834 (2004).
  202. M. J. Kushner, "Modeling of Microdischarge Devices: Pyramidal Structures", J. Appl. Phys. 95, 846 (2004).
  203. X. Li, L. Ling, X. Hua, G. S. Oehrlein, Y. Wang, A. V. Vasenkov and M. J. Kushner, "Properties of C4F8 inductively coupled plasmas. I. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2", J. Vac. Sci. Technol. A 22, 500 (2004).
  204. A. V. Vasenkov, X. Li, G. S. Oehrlein and M. J. Kushner, "Properties of C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C4F8/O2 discharges", J. Vac. Sci. Technol. A 22, 511 (2004).
  205. P. Subramonium and M. J. Kushner, "Extraction of negative ions from pulsed electronegative inductively coupled plasmas having a radio-frequency substrate bias", J. Vac. Sci. Technol. A 22, 534 (2004).
  206. K. Rajaraman and M. J. Kushner, "A Monte Carlo Simulation of Radiation Trapping in Electrodeless Gas Discharge Lamps", J. Phys. D 37, 1780 (2004).
  207. P. Subramoniuim and M. J. Kushner, "Pulsed Inductively Coupled Plasmas as a Method to Recoup Uniformity: Three-dimensional Modeling Study", Appl. Phys. Lett. 85, 721 (2004).
  208. P. Subramoniuim and M. J. Kushner, "Pulsed Plasmas as a Method to Improve Uniformity During Materials Processing", J. Appl. Phys. 96, 82 (2004).
  209. A. Sankaran and M. J. Kushner, "Integrated Feature Scale Modeling of Plasma Processing of Porous and Solid SiO2. I. Fluorocarbon Etching", J. Vac. Sci. Technol. A 22, 1242 (2004).
  210. A. Sankaran and M. J. Kushner, "Integrated Feature Scale Modeling of Plasma Processing of Porous and Solid SiO2. II. Residual Fluorocarbon Polymer Stripping and Barrier Layer Deposition", J. Vac. Sci. Technol. A 22, 1260 (2004).
  211. D. L. Carroll, J. T. Verdeyen, D. M. King, J. W. Zimmerman, J. K. Laystrom, B. S. Woodard, N. Richardson, K. Kittell, Mark J. Kushner, and W. C. Solomon, "Measurement of Positive Gain on the 1315 nm Transition of Atomic Iodine Pumped by O2(a1Δ) Produced in an Electric Discharge", Appl. Phys. Lett. 85, 1320 (2004).
  212. R. S. Moss, J. G. Eden and M. J. Kushner "Avalanche Processes in an Idealized Lamp: I. Measurements of Formative Breakdown Time", J. Phys. D. 37, 2502 (2004).
  213. A. Bhoj and M. J. Kushner "Avalanche Process in an Idealized Lamp: II. Modeling of Breakdown in Ar/Xe Electric Discharges", J. Phys. D. 37, 2510 (2004).
  214. D. S. Stafford and M. J. Kushner "O2(1Δ) Production in He/O2 Mixtures in Flowing Low Pressure Plasmas", J. Appl. Phys. 96, 2451 (2004).
  215. A. Sankaran and M. J. Kushner "Etching of Porous and Solid SiO2 in Ar/c-C4F8, O2/c-C4F8 and Ar/O2/c-C4F8 Plasmas", J. Appl. Phys. 97, 023307 (2005).
  216. V. Vyas and M. J. Kushner "Effect of Ion Streaming on Particle-particle Interactions in a Dusty Plasma", J. Appl. Phys. 97, 043303 (2005).
  217. D. L. Carroll, J. T. Verdeyen, D. M. King, J. W. Zimmerman, J. K. Laystrom, B. S. Woodard, G. F. Benavides, K. Kittell, D. S. Stafford, M. J. Kushner and W. C. Solomon "Continuous-wave Laser Oscillation on the 1315 nm Transition of Atomic Iodine Pumped by O2(a1Δ) Produced in an Electric Discharge", Appl. Phys. Lett. 86, 111104 (2005).
  218. M. J. Kushner and G. A. Hebner "Guest Editorial: Fourth Triennial Special Issue of Images in Plasma Science", IEEE Trans. Plasma Sci. 33, 224 (2005).
  219. A. N. Bhoj and M. J. Kushner, "Plasma Polymer Interactions in a Dielectric Barrier Discharge", Trans. Plasma Sci. 33, 250 (2005).
  220. A. Agarwal and M. J. Kushner, "Time Evolution of Ion Energy Distributions for Plasma Doping", Trans. Plasma Sci. 33, 252 (2005).
  221. M. J. Kushner and A. V. Vasenkov, "Electron Velocity Distributions in an Inductively Coupled Plasma", Trans. Plasma Sci. 33, 388 (2005).
  222. A. N. Bhoj and M. J. Kushner, "Plasma Dynamics During Breakdown in an HID Lamp", Trans. Plasma Sci. 33, 518 (2005).
  223. M. J. Kushner, "Modelling of Microdischarge Devices: Plasma and Gas Dynamics", J. Phys. D 38, 1633 (2005).
  224. A. Agarwal and M. J. Kushner, "Effect of Nonsinusoidal Bias Waveforms on Ion Energy Distributions and Fluorocarbon Plasma Etch Selectivity", J. Vac. Sci. Technol. A 23, 1440 (2005).
  225. D. Shane Stafford and M. J. Kushner "O2(1Δ) Production in Flowing He/O2 Plasmas I: Axial Transport and Pulsed Power Formats", J. Appl. Phys. 98, 073303 (2005).
  226. R. Arakoni, D. Shane Stafford, N. Y. Babaeva and M. J. Kushner "O2(1Δ) Production in Flowing He/O2 Plasmas II: Two-dimensional Modeling", J. Appl. Phys. 98, 073304 (2005).
  227. A. N. Bhoj and M. J. Kushner "Multi-scale Simulation of Functionalization of Rough Polymer Surfaces Using Atmospheric Pressure Plasmas", J. Phys. D 39, 1594 (2006).
  228. Natalia Yu. Babaeva. R. A. Arakoni and M. J. Kushner "Production of O2(1Δ) in Flowing Plasmas Using Spiker-Sustainer Excitation", J. Appl. Phys. 99, 113306 (2006).
  229. Natalia Yu. Babaeva. A. N. Bhoj and M. J. Kushner "Streamer Dynamics in Gases Containing Dust Particles", Plasma Source Sci. Technol. 15, 591 (2006).
  230. V. Vyas and M. J. Kushner "Scaling of Hollow Cathode Magnetrons for Ionized Metal Physical Vapor Deposition", J. Vac. Sci. Technol. A 24, 1955 (2006).
  231. A. Agarwal and M. J. Kushner "Characteristics of Pulsed Plasma Doping Sources for Ultrashallow Junction Formation", J. Appl. Phys. 101, 063305 (2007).
  232. R. A. Arakoni, A. N. Bhoj and M. J. Kushner "H2 Generation in Ar/NH3 Microdischarges", J. Phys. D. 40, 2476 (2007).
  233. N. Y. Babaeva and M. J. Kushner "Penetration of Plasma into the Wafer-Focus Ring Gap in Capacitively Coupled Plasmas", J. Appl. Phys. 101, 113307 (2007).
  234. N. Y. Babaeva, R. A. Arakoni and M. J. Kushner "O2(1Δ) Production in High Pressure flowing He/O2 Plasmas: Scaling and Quenching", J. Appl. Phys. 101, 123306 (2007).
  235. R. A. Arakoni, N. Y. Babaeva and M. J. Kushner "O2(1Δ) Production and Gain in Plasma Pumped Oxygen-Iodine Lasers: Consequences of NO and NO2 Additives", J. Phys. D 40, 4793 (2007).
  236. Y. Yang and M. J. Kushner "Modeling of Magnetically Enhanced Capacitively Coupled Plasma Sources: Two Frequency Discharges", J. Vac. Sci. Technol. A 25, 1420 (2007).
  237. A. N. Bhoj and M. J. Kushner "Continuous Processing of Polymers in Repetitively Pulsed Atmospheric Pressure Discharges with Moving Surfaces and Gas Flow", J. Phys. D 40, 6953 (2007).
  238. N. Y. Babaeva and M. J. Kushner "Ion Energy and Angular Distributions into the Wafer - Focus Ring Gap in Capacitively Coupled Discharges", J. Phys. D 41, 062004 (2008).
  239. A. Agarwal and M. J. Kushner "Seasoning of Plasma Etching Reactors: Ion energy Distributions to Walls and Real-time and Run-to-run Control Strategies", J. Vac. Sci. Technol. A 26, 498 (2008).
  240. R. Arakoni, J. J. Ewing and M. J. Kushner "Microdischarges for Use as Microthrusters: Modelling and Scaling", J. Phys. D 41, 105208 (2008).
  241. A. N. Bhoj and M. J. Kushner "Repetitively Pulsed Atmospheric Pressure Discharge Treatment of Rough Polymer Surfaces: I. Humid air discharges", Plasma Sources Sci. Technol. 17, 035024 (2008).
  242. A. N. Bhoj and M. J. Kushner "Repetitively Pulsed Atmospheric Pressure Discharge Treatment of Rough Polymer Surfaces: II. Treatment of micro-beads in He/NH3/H2O and He/O2/H2O mixtures", Plasma Sources Sci. Technol. 17, 035025 (2008).
  243. N. Yu. Babaeva and M. J. Kushner, "Guest Editorial: 5th Triennial Special Issue of Transactions on Plasma Science on Images in Plasma Science", Trans. Plasma Sci. 36, 862 (2008).
  244. N. Yu. Babaeva and M. J. Kushner, "Streamer Branching: The Role of Inhomogeneities and Bubbles", Trans. Plasma Sci. 36, 892 (2008).
  245. A. Agarwal and M. J. Kushner, "Plasma Atomic Layer Etching Using Conventional Plasma Equipment", J. Vac. Sci. Technol. A 27, 37 (2009).
  246. N. Yu. Babaeva and M. J. Kushner, "Effect of inhomogeneities on streamer propagation: I. Intersection with isolated bubbles and particles", Plasma Sources Sci. Technol 18, 035010 (2009).
  247. N. Yu. Babaeva and M. J. Kushner, "Effect of inhomogeneities on streamer propagation: II. Streamer dynamics in high pressure humid air with bubbles", Plasma Sources Sci. Technol 18, 035009 (2009).
  248. N. Yu. Babaeva and M. J. Kushner, "Structure of positive streamers inside gaseous bubbles immersed in liquids", J. Phys. D 42, 132003 (2009).
  249. J. Shoeb and M. J. Kushner, "Mechanisms for Plasma Etching of HfO2 Gate Stacks with Si Selectivity and Photoresist Trimming", J. Vac. Sci. Technol. A 47, 1289 (2009).
  250. M. J. Kushner, "Hybrid Modelling of Low Temperature Plasmas for Fundamental Investigations and Equipment Design", J. Phys. D 42, 194013 (2009).
  251. M. Wang and M. J. Kushner, "High energy electron fluxes in dc-augmented capacitively coupled plasmas: I. Fundamental characteristics", J. Appl. Phys 107, 023308 (2010).
  252. M. Wang and M. J. Kushner, "High energy electron fluxes in dc-augmented capacitively coupled plasmas: II. Effects on twisting in high aspect ratio etching of dielectrics", J. Appl. Phys 107, 023309 (2010).
  253. S. Kirk, M. Strobel, C-Y. Lee, S. J. Pachuta, M. Prokosch, H. Lechuga, M. E. Jones, Ch. S. Lyons, S. Degner, Y. Yang and M. J. Kushner "Fluorine Plasma Treatments of Polypropylene Films: I. Surface Characterization", Plasma Proc. Polymers 7, 107 (2010).
  254. Y. Yang, M. Strobel, S. Kirk and M. J. Kushner "Fluorine Plasma Treatments of Polypropylene Films: II. Modeling Reaction Mechanisms and Scaling", Plasma Proc. Polymers 7, 123 (2010).
  255. Y. Yang and M. J. Kushner "Graded Conductivity Electrodes as a Means to Improve Plasma Uniformity in Dual Frequency Capacitively Coupled Plasma Sources", J. Phys. D 43, 152001 (2010).
  256. N. Yu. Babaeva and M. J. Kushner "Intracellular Electric Fields Produced by Dielectric Barrier Discharge Treatment of Skin", J. Phys. D 43, 185206 (2010).
  257. Y. Yang and M. J. Kushner "Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency", Plasma Sources Sci. Technol. 19, 055011 (2010).
  258. Y. Yang and M. J. Kushner "Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity", Plasma Sources Sci. Technol. 19, 055012 (2010).
  259. Y. Yang and M. J. Kushner "450 mm Dual Frequency Capacitively Coupled Plasma Sources: Conventional, Graded and Segmented Electrodes", J. Appl. Phys 108, 113306 (2010).
  260. Z. Xiong and M. J. Kushner "Surface Corona-Bar Discharges for Production of Pre-ionizing UV Light for Pulsed High-Pressure Plasmas", J. Phys D 43, 505204 (2010).
  261. B. S. Sommers, J. E. Foster, N. Yu Babaeva and M. J. Kushner "Observations of Electric Discharge Streamer Propagation and Capillary Oscillations on the Surface of Air Bubbles in Water", J. Phys D 44, 082001 (2011).
  262. N. Yu Babaeva and M. J. Kushner "Ion energy and angular distributions onto polymer surfaces delivered by dielectric barrier discharge filaments in air: I. Flat surfaces", Plasma Source Sci. Technol. 20, 035017 (2011).
  263. N. Yu Babaeva and M. J. Kushner "Ion energy and angular distributions onto polymer surfaces delivered by dielectric barrier discharge filaments in air: II. Particles", Plasma Source Sci. Technol. 20, 035018 (2011).
  264. J. Shoeb and M. J. Kushner "Mechanisms for sealing of porous low-k SiOCH by combined He and NH3 plasma treatment", J. Vac. Sci. Technol. A 29, 051305 (2011).
  265. M. Wang and M. J. Kushner "Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas", J. Vac. Sci. Technol. A 29, 051306 (2011).
  266. K. Takashima, I. V. Adamovich, Z. Xiong, M. J. Kushner, S. Starikovskaia, U. Czarnetzki and D. Luggenhölscher "Experimental and modeling analysis of fast ionization wave discharge propagation in a rectangular geometry", Phys. Plasmas 18, 083505 (2011).
  267. Z. Xiong, M. J. Kushner, "Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers", J. Appl. Phys 110, 083304 (2011).
  268. A. Wollny, T. Hemke, M. Gebhardt,R. P. Brinkmann, H. Boettner, J. Winter, V. Schulz-von der Gathen, Z. Xiong, M. J. Kushner and T. Mussenbrock, "Ionization wave propagation on a micro cavity plasma array", Appl. Phys. Lett. 99, 141504 (2011).
  269. B. Niermann, T. Hemke, N. Y. Babaeva, M. Böke, M. J. Kushner, T. Mussenbrock and J. Winter, "Spatial dynamics of helium metastables in sheath or bulk dominated rf micro-plasma jets", J. Phys. D: Appl. Phys. 44, 485204 (2011).
  270. N. Yu. Babaeva and M. J. Kushner, "Guest Editorial: 6th Triennial Special Issue of the IEEE Transactions on Plasma Science: Images in Plasma Science", IEEE Transactions on Plasma Science 39, 2057 (2011).
  271. J.-C. Wang, N. Leoni, H. Birecki, O. Gila and M. J. Kushner, "Electron Current From an RF Microdielectric Barrier Discharge", IEEE Transactions on Plasma Science 39, 2168 (2011).
  272. M. Wang, J. E. Foster and M. J. Kushner, "Plasma Propagation Through Porous Dielectric Sheets", IEEE Transactions on Plasma Science 39, 2244 (2011).
  273. Z. Xiong and M. J. Kushner, "Ionization Wave Splitting at the T-Junction of a Dielectric Channel", IEEE Transactions on Plasma Science 39, 2320 (2011).
  274. S.-H. Song and M. J. Kushner, "Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma", IEEE Transactions on Plasma Science 39, 2542 (2011).
  275. J. Shoeb and M. J. Kushner, "Polymer Cleaning From Porous Low-k Dielectrics in He/H2 Plasmas", IEEE Transactions on Plasma Science 39, 2828 (2011).
  276. N. Yu. Babaeva and M. J. Kushner, "Dynamics of Dielectric Barrier Discharges Over Wounded Skin", IEEE Transactions on Plasma Science 39, 2964 (2011).
  277. Z. Xiong and M. J. Kushner, "Atmospheric Pressure Ionization Waves Propagating Through a Flexible High Aspect Ratio Capillary Channel and Impinging upon a Target", Plasma Sources Sci. Technol. 21, 034001 (2012).
  278. N. Yu. Babaeva, N. Ning, D. B. Graves and M. J. Kushner, "Ion Activation Energy Delivered to Wounds by Atmospheric Pressure Dielectric-Barrier Discharges: Sputtering of Lipid-Like Surfaces", J. Phys. D: Appl. Phys. 45, 115203 (2012). [Featured as cover image for 21 March 2012 issue of J. Phys. D: Appl. Phys.]
  279. J. Shoeb, M. M. Wang and M. J. Kushner, "Damage by Radicals and Photons During Plasma Cleaning of Porous low-k SiOCH. I. Ar/O2 and He/H2 Plasmas", J. Vac. Sci. Technol. A 30, 041303 (2012).
  280. J. Shoeb and M. J. Kushner, "Damage by Radicals and Photons During Plasma Cleaning of Porous low-k SiOCH. II. Water Uptake and Change in Dielectric Constant", J. Vac. Sci. Technol. A 30, 041304 (2012).
  281. S. Samukawa, M. Hori, S. Rauf, K. Tachibana, P. Bruggeman, G. Kroesen, J. Ch. Whitehead, A. B. Murphy, A. F. Gutsol, S. Starikovskaia, U. Kortshagen, J.-P. Boeuf, T. J. Sommerer, M. J. Kushner, U. Czarnetzki and N. Mason, "The 2012 Plasma Roadmap (Review Article)", J. Phys. D: Appl. Phys. 45, 253001 (2012).
  282. Z. Xiong, E. Robert, V. Sarron, J.-M. Pouvesle and M. J. Kushner, "Dynamics of Ionization Wave Splitting and Merging of Atmospheric-Pressure Plasmas in Branched Dielectric Tubes and Channels", J. Phys. D: Appl. Phys. 45, 275201 (2012).
  283. S.-H. Song and M. J. Kushner, "Control of Electron Energy Distributions and Plasma Characteristics of Dual Frequency, Pulsed Capacitively Coupled Plasmas Sustained in Ar and Ar/CF4/O2", Plasma Sources Sci. Technol. 21, 055028 (2012).
  284. M. D. Logue, H. Shin, W. Zhu, L. Xu, V. M. Donnelly, D. J. Economou and M. J. Kushner, "Ion Energy Distributions in Inductively Coupled Plasmas Having a Biased Boundary Electrode, Plasma Sources Sci. Technol. 21, 065009 (2012).
  285. N. Yu. Babaeva and M. J. Kushner, "Reactive Fluxes Delivered by Dielectric Barrier Discharge Filaments to Slightly Wounded Skin", J. Phys. D: Appl. Phys. 46, 025401 (2013).
  286. J.-C. Wang, N. Leoni, H. Birecki, O. Gila and M. J. Kushner, "Electron Current Extraction from Radio Frequency Excited Micro-dielectric Barrier Discharges", J. Appl. Phys. 113, 033301 (2013).
  287. N. Yu. Babaeva and M. J. Kushner, "Control of Ion Activation Energy Delivered to Tissue and Sensitive Materials in Atmospheric Pressure Plasmas Using Thin Porous Dielectric Sheets", J. Phys. D: Appl. Phys. 46, 125201 (2013).
  288. Z. Xiong, E. Robert, V. Sarron, J.-M. Pouvesle and M. J. Kushner, "Atmospheric-pressure Plasma Transfer across Dielectric Channels and Tubes", J. Phys. D: Appl. Phys. 46, 155203 (2013).
  289. J.-C. Wang, N. Leoni, H. Birecki, O. Gila and M. J. Kushner, "Characteristics of a Radio-frequency Micro-dielectric Barrier Discharge Array", Plasma Sources Sci. Technol. 22, 025015 (2013).
  290. N. B. Moore, W. Gekelman, P. Pribyl, Y. Zhang and M. J. Kushner, "2-dimensional Ion Velocity Distributions Measured by Laser-induced Fluorescence above a Radio-frequency Biased Silicon Wafer", Physics of Plasmas 20, 083506 (2013).
  291. Y. Zhang, M. J. Kushner, N. B. Moore, P. Pribyl and W. Gekelman, "Space and Phase Resolved Ion Energy and Angular Distributions in Single- and Dual-frequency Capacitively Coupled Plasmas", J. Vac. Sci. Technol. A 31, 061311 (2013).
  292. W. Tian, K. Tachibana and M. J. Kushner, "Plasmas Sustained in Bubbles in Water: Optical Emission and Excitation Mechanisms", J. Phys. D: Appl. Phys. 47, 055202 (2014).
  293. N. Yu. Babaeva and M. J. Kushner, "Interaction of Multiple Atmospheric-pressure Micro-plasma Jets in Small Arrays: He/O2 into Humid Air", Plasma Sources Sci. Technol. 23, 015007 (2014).
  294. E. Schüngel, S. Mohr, J. Schulze, U. Czarnetzki and M. J. Kushner, "Ion Distribution Functions at the Electrodes of Capacitively Coupled High-pressure Hydrogen Discharges", Plasma Sources Sci. Technol. 23, 015001 (2014).
  295. S.-H. Song and M. J. Kushner, "Role of the Blocking Capacitor in Control of Ion Energy Distributions in Pulsed Capacitively Coupled Plasmas Sustained in Ar/CF4/O2", J. Vac. Sci. Technol. A 32, 021306 (2014).
  296. W. Tian and M. J. Kushner, "Atmospheric Pressure Dielectric Barrier Discharges Interacting with Liquid Covered Tissue", J. Phys. D: Appl. Phys. 47, 165201 (2014).
  297. N. Yu. Babaeva, W. Tian and M. J. Kushner, "The Interaction Between Plasma Filaments in Dielectric Barrier Discharges and Liquid Covered Wounds: Electric Fields Delivered to Model Platelets and Cells", J. Phys. D: Appl. Phys. 47, 235201 (2014).
  298. O. Zatsarinny, K. Bartschat, N. Yu. Babaeva and M. J. Kushner, "Electron Collisions with Cesium Atoms—benchmark Calculations and Application to Modeling an Excimer-pumped Alkali Laser", Plasma Sources Sci. Technol. 23, 035011 (2014).
  299. J.-C. Wang, D. Zhang, N. Leoni, H. Birecki, O. Gila, and M. J. Kushner, "Charging of Moving Surfaces by Corona Discharges Sustained in Air", J. Appl. Phys. 116, 043301 (2014).
  300. A. V. Klochko, S. M. Starikovskaia, Z. Xiong and M. J. Kushner, "Investigation of Capillary Nanosecond Discharges in Air at Moderate Pressure: Comparison of Experiments and 2D Numerical Modelling", J. Phys. D: Appl. Phys. 47, 365202 (2014).
  301. B. R. Weatherford, Z. Xiong, E. V. Barnat and M. J. Kushner, "Spatial Profiles of Electron and Metastable Atom Densities in Positive Polarity Fast Ionization Waves Sustained in Helium", J. Appl. Phys. 116, 103305 (2014).
  302. S.-H. Song, Y. Yang, P. Chabert and M. J. Kushner, "Electron Energy Distributions in a Magnetized Inductively Coupled Plasma", Physics of Plasmas 21, 093512 (2014).
  303. Z. Xiong and M. J. Kushner, "Branching and Path-deviation of Positive Streamers Resulting from Statistical Photon Transport", Plasma Sources Sci. Technol. 23, 065041 (2014).
  304. S. A. Norberg, W. Tian, E. Johnsen and M. J. Kushner, "Atmospheric Pressure Plasma Jets Interacting with Liquid Covered Tissue: Touching and Not-touching the Liquid", J. Phys. D: Appl. Phys. 47, 475203 (2014).
  305. N. Yu. Babaeva and M. J. Kushner, "Self-Organization of Single Filaments and Diffusive Plasmas During a Single Pulse in Dielectric-Barrier Discharges", Plasma Sources Sci. Technol. 23, 065047 (2014).
  306. C. K. Eun, X. Luo, J.-C. Wang, Z. Xiong, M. Kushner and Y. Gianchandani, "A Microdischarge-Based Monolithic Pressure Sensor", J. Microelectromechanical Systems 23, 1300 (2014).
  307. M. D. Logue and M. J. Kushner, "Electron Energy Distributions and Electron Impact Source Functions in Ar/N2 Inductively Coupled Plasmas Using Pulsed Power", J. Appl. Phys. 117, 043301 (2015). [Featured as cover image for 28 January 2015 issue of Journal of Applied Physics.]
  308. Y. Zhang, M. J. Kushner, S. Sriraman, A. Marakhtanov, J. Holland and A. Paterson, "Control of Ion Energy and Angular Distributions in Dual-frequency Capacitively Coupled Plasmas through Power Ratios and Phase: Consequences on Etch Profiles", J. Vac. Sci. Technol. A 33, 031302 (2015).
  309. A. Schmidt-Bleker, S. A. Norberg, J. Winter, E. Johnsen, S. Reuter, K. D. Weltmann and M. J. Kushner, "Propagation Mechanisms of Guided Streamers in Plasma Jets: the Influence of Electronegativity of the Surrounding Gas", Plasma Sources Sci. Technol. 24, 035022 (2015).
  310. S. A. Norberg, E. Johnsen and M. J. Kushner, "Formation of Reactive Oxygen and Nitrogen Species by Repetitive Negatively Pulsed Helium Atmospheric Pressure Plasma Jets Propagating into Humid Air", Plasma Sources Sci. Technol. 24, 035026 (2015).
  311. P. Tian and M. J. Kushner, "Controlling VUV Photon Fluxes in Low-pressure Inductively Coupled Plasmas", Plasma Sources Sci. Technol. 24, 034017 (2015).
  312. Y. Zhang, A. Zafar, D. J. Coumou, S. C. Shannon and M. J. Kushner, "Control of Ion Energy Distributions Using Phase Shifting in Multi-frequency Capacitively Coupled Plasmas", J. Appl. Phys. 117, 233302 (2015).
  313. S. A. Norberg, E. Johnsen and M. J. Kushner, "Helium Atmospheric Pressure Plasma Jets Touching Dielectric and Metal Surfaces", J. Appl. Phys. 118, 013301 (2015). [Featured as cover image for 7 July 2015 issue of Journal of Applied Physics.]
  314. L. Liu, S. Sridhar, W. Zhu, V. M. Donnelly, D. J. Economou, M. D. Logue and M. J. Kushner, "External Control of Electron Energy Distributions in a Dual Tandem Inductively Coupled Plasma", J. Appl. Phys. 118, 083303 (2015).
  315. J. E. Cooley, R. Urdahl, J. Xue, M. Denning, P. Tian and M. J. Kushner, "Properties of Microplasmas Excited by Microwaves for VUV Photon Sources", Plasma Sources Sci. Technol. 24, 065009 (2015).
  316. W. Tian and M. J. Kushner, "Long-term Effects of Multiply Pulsed Dielectric Barrier Discharges in Air on Thin Water Layers over Tissue: Stationary and Random Streamers", J. Phys. D: Appl. Phys. 48, 494002 (2015).
  317. S. A. Norberg, E. Johnsen and M. J. Kushner, "Helium Atmospheric Pressure Plasma Jets Interacting with Wet Cells: Delivery of Electric Fields", J. Phys. D: Appl. Phys. 49, 185201 (2016).
  318. R. Le Picard, A. H. Markosyan, D. H. Porter, S. L. Girshick and M. J. Kushner, "Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport", Plasma Chem. Plasma Process. 36, 941-972 (2016).
  319. K. Bartschat and M. J. Kushner, "Electron Collisions with Atoms, Ions, Molecules, and Surfaces: Fundamental Science Empowering Advances in Technology", PNAS 113, 7026–7034 (2016).
  320. W. Tian, A. M. Lietz and M. J. Kushner, "The Consequences of Air Flow on the Distribution of Aqueous Species During Dielectric Barrier Discharge Treatment of Thin Water Layers", Plasma Sources Sci. Technol. 25, 055020 (2016).
  321. M. J. Kushner, "Viewpoint: The development of uniform atmospheric pressure glow discharges: appearance of stable glow discharge in air, argon, oxygen and nitrogen at atmospheric pressure using a 50 Hz source (S Okazaki et al 1993 J. Phys. D: Appl. Phys. 26 889)", J. Phys. D: Appl. Phys. 49, 401001 (2016).
  322. A. M. Lietz and M. J. Kushner, "Air Plasma Treatment of Liquid Covered Tissue: Long Timescale Chemistry", J. Phys. D: Appl. Phys. 49, 425204 (2016). [Corrigendum: J. Phys. D 50, 119501 (2017)]
  323. P. J. Bruggeman, M. J. Kushner, B. R. Locke, J. G. E. Gardeniers, W. G. Graham, D. B. Graves, R. C. H. M. Hofman-Caris, D. Maric, J. P. Reid, E. Ceriani, D. Fernandez Rivas, J. E. Foster, S. C. Garrick, Y. Gorbanev, S. Hamaguchi, F. Iza, H. Jablonowski, E. Klimova, J. Kolb, F. Krcma, P. Lukes, Z. Machala, I. Marinov, D. Mariotti, S. Mededovic Thagard, D. Minakata, E. C. Neyts, J. Pawlat, Z. Lj. Petrovic, R. Pflieger, S. Reuter, D. C. Schram, S. Schröter, M. Shiraiwa, B. Tarabová, P. A. Tsai, J. R. R. Verlet, T. von Woedtke, K. R. Wilson, K. Yasui and G. Zvereva, "Review: Plasma–liquid Interactions: a Review and Roadmap", Plasma Sources Sci. Technol. 25, 053002 (2016).
  324. A. H. Markosyan and M. J. Kushner, "Plasma Formation in Diode Pumped Alkali Lasers Sustained in Cs", J. Appl. Phys. 120, 193105 (2016).
  325. Y. Zhang, C. Huard, S. Sriraman, J. Belen, A. Paterson and M. J. Kushner, "Investigation of Feature Orientation and Consequences of Ion Tilting During Plasma Etching with a Three-dimensional Feature Profile Simulator", J. Vac. Sci. Technol. A 35, 021303 (2017).
  326. J. Kruszelnicki, K. W. Engeling, J. E. Foster, Z. Xiong and M. J. Kushner, "Propagation of Negative Electrical Discharges Through 2-dimensional Packed Bed Reactors", J. Phys. D: Appl. Phys. 50, 025203 (2017).
  327. A. R. Gibson, M. Foucher, D. Marinov, P. Chabert, T. Gans, M. J. Kushner and J.-P. Booth, "The Role of Thermal Energy Accommodation and Atomic Recombination Probabilities in Low Pressure Oxygen Plasmas", Plasma Phys. Control. Fusion 59, 024004 (2017).
  328. C. Huard, Y. Zhang, S. Sriraman, A. Paterson and M. J. Kushner, "Role of Neutral Transport in Aspect Ratio Dependent Plasma Etching of Three-dimensional Features", J. Vac. Sci. Technol. A 35, 05C301 (2017).
  329. P. Tian and M. J. Kushner, "Controlling VUV Photon Fluxes in Pulsed Inductively Coupled Ar/Cl2 Plasmas and Potential Applications in Plasma Etching", Plasma Sources Sci. Technol. 26, 024005 (2017).
  330. S. Huang, V. Volynets, J. R. Hamilton, S. Lee, I.-C. Song, S. Lu, J. Tennyson and M. J. Kushner, "Insights to Scaling Remote Plasma Sources Sustained in NF3 Mixtures", J. Vac. Sci. Technol. A 35, 031302 (2017).
  331. C. Huard, Y. Zhang, S. Sriraman, A. Paterson, K. J. Kanarik and M. J. Kushner, "Atomic Layer Etching of 3D Structures in Silicon: Self-limiting and Nonideal Reactions", J. Vac. Sci. Technol. A 35, 031306 (2017). [Featured in Beneath the AVS Surface, May 2017].
  332. J. R. Hamilton, J. Tennyson, S. Huang and M. J. Kushner, "Calculated Cross Sections for Electron Collisions with NF3, NF2 and NF with Applications to Remote Plasma Sources", Plasma Sources Sci. Technol. 26, 065010 (2017).
  333. A. H. Markosyan, S. R. Green, S. Deng, Y. B. Gianchandani and M. J. Kushner, "Miniaturized Magnet-less RF Electron Trap. I. Modeling and Analysis", J. Vac. Sci. Technol. B 35, 042001 (2017).
  334. S. Deng, S. R. Green, A. H. Markosyan, M. J. Kushner and Y. B. Gianchandani, "Miniaturized Magnet-less RF Electron Trap. II. Experimental Verification", J. Vac. Sci. Technol. B 35, 042002 (2017).
  335. I. Adamovich, S. D. Baalrud, A. Bogaerts, P. J. Bruggeman, M. Cappelli, V. Colombo, U. Czarnetzki, U. Ebert, J. G. Eden, P. Favia, D. B. Graves, S. Hamaguchi, G. Hieftje, M. Hori, I. D. Kaganovich, U. Kortshagen, M. J. Kushner, N. J. Mason, S. Mazouffre, S. Mededovic Thagard, H.-R. Metelmann, A. Mizuno, E. Moreau, A. B. Murphy, B. A. Niemira, G. S. Oehrlein, Z. Lj. Petrovic, L. C. Pitchford, Y.-K. Pu, S. Rauf, O. Sakai, S. Samukawa, S. Starikovskaia, J. Tennyson, K. Terashima, M. M. Turner, M. C. M. van de Sanden, A. Vardelle, "Topical Review: The 2017 Plasma Roadmap: Low Temperature Plasma Science and Technology", J. Phys. D: Appl. Phys. 50, 323001 (2017).
  336. S. J. Lanham and M. J. Kushner, "Effects of a Chirped Bias Voltage on Ion Energy Distributions in Inductively Coupled Plasma Reactors", J. Appl. Phys. 122, 083301 (2017). [Featured as cover image for 28 August 2017 issue of Journal of Applied Physics.]
  337. A. M. Lietz, E. Johnsen and M. J. Kushner, "Plasma-induced Flow Instabilities in Atmospheric Pressure Plasma Jets", Appl. Phys. Lett. 111, 114101 (2017). [Press release]
  338. C. Qu, P. Tian, A. Semnani and M. J. Kushner, "Properties of Arrays of Microplasmas: Application to Control of Electromagnetic Waves", Plasma Sources Sci. Technol. 26, 105006 (2017).
  339. S. J. Doyle, T. Lafleur, A. R. Gibson, P. Tian, M. J. Kushner and J. Dedrick, "Enhanced Control of the Ionization Rate in Radio-frequency Plasmas with Structured Electrodes via Tailored Voltage Waveforms", Plasma Sources Sci. Technol. 26, 125005 (2017).
  340. S. Schröter, A. R. Gibson, M. J. Kushner, T. Gans and D. O’Connell, "Numerical Study of the Influence of Surface Reaction Probabilities on Reactive Species in an rf Atmospheric Pressure Plasma Containing Humidity", Plasma Phys. Control. Fusion 60, 014035 (2018).
  341. N. Yu. Babaeva, G. V. Naidis and M. J. Kushner, "Interaction of Positive Streamers in Air with Bubbles Floating on Liquid Surfaces: Conductive and Dielectric Bubbles", Plasma Sources Sci. Technol. 27, 015016 (2018).
  342. S. Huang, V. Volynets, J. R. Hamilton, S. K. Nam, I.-C. Song, S. Luf, J. Tennyson and M. J. Kushner, "Downstream Etching of Silicon Nitride Using Continuous-wave and Pulsed Remote Plasma Sources Sustained in Ar/NF3/O2 Mixtures", J. Vac. Sci. Technol. A 36, 021305 (2018). [Selected as an Editor's Pick]
  343. C. M. Huard, S. J. Lanham and M. J. Kushner, "Consequences of Atomic Layer Etching on Wafer Scale Uniformity in Inductively Coupled Plasmas", J. Phys. D: Appl. Phys. 51, 155201 (2018).
  344. K. W. Engeling, J. Kruszelnicki, M. J. Kushner and J. E. Foster, "Time-resolved Evolution of Microdischarges, Surface Ionization Waves and Plasma Propagation in a Two-dimensional Packed Bed Reactor", Plasma Sources Sci. Technol. 27, 085002 (2018).
  345. S. J. Doyle, A. R. Gibson, J. Flatt, T. S. Ho, R. W. Boswell, C. Charles, P. Tian, M. J. Kushner and J. Dedrick, "Spatio-temporal Plasma Heating Mechanisms in a Radio Frequency Electrothermal Microthruster", Plasma Sources Sci. Technol. 27, 085011 (2018).
  346. S. Schröter, A. Wijaikhum, A. R. Gibson, A. West, H. L. Davies, N. Minesi, J. Dedrick, E. Wagenaars, N. de Oliveira, L. Nahon, M. J. Kushner, J.-P. Booth, K. Niemi, T. Gans and D. O’Connell, "Chemical Kinetics in an Atmospheric Pressure Helium Plasma Containing Humidity", Phys.Chem.Chem.Phys. 20, 24263 (2018).
  347. A. Lietz and M. J. Kushner, "Molecular Admixtures and Impurities in Atmospheric Pressure Plasma Jets", J. Appl. Phys. 124, 153303 (2018). [Selected as an Editor's Pick]
  348. C. M. Huard, S. Sriraman, A. Paterson and M. J. Kushner, "Transient Behavior in Quasi-atomic Layer Etching of Silicon Dioxide and Silicon Nitride in Fluorocarbon Plasmas", J. Vac. Sci. Technol. A 36, 06B101 (2018). [Selected as an Editor's Pick; AIP Scilight 18 October 2018]
  349. M. A. Zidan, Y.J. Jeong, J. Lee, B. Chen, S. Huang, M. J. Kushner and W. D. Lu, "A General Memristor-based Partial Differential Equation Solver", Nature Electronics 1, 411-420 (2018).
  350. A. M. Lietz and M. J. Kushner, "Electrode Configurations in Atmospheric Pressure Plasma Jets: Production of Reactive Species", Plasma Sources Sci. Technol. 27, 105020 (2018).
  351. S. A. Norberg, G. M. Parsey, A. M. Lietz , E. Johnsen and M. J. Kushner, "Atmospheric Pressure Plasma Jets onto a Reactive Water Layer over Tissue: Pulse Repetition Rate as a Control Mechanism", J. Phys. D: Appl. Phys. 52, 015201 (2019).
  352. Y. Luo, A. M. Lietz, S. Yatom, M. J. Kushner and P. J. Bruggeman, "Plasma Kinetics in a Nanosecond Pulsed Filamentary Discharge Sustained in Ar–H2O and H2O", J. Phys. D: Appl. Phys. 52, 044003 (2019).
  353. S. Huang, C. Huard, S. Shim, S. K. Nam, I.-C. Song, S. Lu and M. J. Kushner, "Plasma Etching of High Aspect Ratio Features in SiO2 Using Ar/C4F8/O2 Mixtures: A Computational Investigation", J. Vac. Sci. Technol. A 37, 031304 (2019). [Selected as an Editor's Pick]
  354. M. Menati, E. Thomas and M. J. Kushner, "Filamentation of Capacitively Coupled Plasmas in Large Magnetic Fields", Phys. Plasmas 26, 063515 (2019). [Selected as an Editor's Pick]
  355. J. Kruszelnicki, A. M. Lietz and M. J. Kushner, "Atmospheric Pressure Plasma Activation of Water Droplets", J. Phys. D: Appl. Phys. 52, 355207 (2019).
  356. J. Han, P. Pribyl, W. Gekelman , A. Paterson, S. J. Lanham , C. Qu and Mark J. Kushner, "Three-dimensional Measurements of Plasma Parameters in an Inductively Coupled Plasma Processing Chamber", Phys. Plasmas 26, 103503 (2019). [Selected for cover of Physics of Plasmas vol. 26, Issue 10, Oct. 2019]
  357. A. M. Lietz, X. Damany, E. Robert, J.-M. Pouvesle and M. J. Kushner, "Ionization Wave Propagation in an Atmospheric Pressure Plasma Multi-jet", Plasma Sources Sci. Technol. 28, 125009 (2019).
  358. S. Mohades, A. M. Lietz, J. Kruszelnicki and M. J. Kushner, "Helium Plasma Jet Interactions with Water in Well Plates", Plasma Process Polym. 17, e1900179 (2020).
  359. Z.-u-I. Mujahid, J. Kruszelnicki, A. Hala and M. J. Kushner, "Formation of Surface Ionization Waves in a Plasma Enhanced Packed Bed Reactor for Catalysis Applications", Chemical Engineering Journal 382, 123038 (2020).
  360. S. Huang, S. Shim, S. K. Nam and M. J. Kushner, "Pattern Dependent Profile Distortion During Plasma Etching of High Aspect Ratio Features in SiO2", J. Vac. Sci. Technol. A 38, 023001 (2020).
  361. V. Volynets, Y. Barsukov, G. Kim, J.-E. Jung, S. K. Nam, K. Han, S. Huang, and M. J. Kushner, "Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. I. Plasma Source and Critical Fluxes", J. Vac. Sci. Technol. A 38, 023007 (2020).
  362. J.-E. Jung, Y. Barsukov, V. Volynets, G. Kim, S. K. Nam, K. Han, S. Huang, and M. J. Kushner, "Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. II. Surface Reaction Mechanism", J. Vac. Sci. Technol. A 38, 023008 (2020).
  363. C. Qu, S. J. Lanham, S. C. Shannon, S. K. Nam and M. J. Kushner, "Power Matching to Pulsed Inductively Coupled Plasmas", J. Appl. Phys. 127, 133302 (2020).
  364. A. M. Lietz, E. V. Barnat, J. E. Foster, and M. J. Kushner, "Ionization Wave Propagation in a He Plasma Jet in a Controlled Gas Environment ", J. Appl. Phys. 128, 083301 (2020). [Selected for cover of Journal of Applied Physics vol. 128, Issue 8, Aug. 2020]
  365. C. Qu, S. K. Nam and M. J. Kushner, "Transients Using Low-high Pulsed Power in Inductively Coupled Plasmas", Plasma Sources Sci. Technol. 29, 085006 (2020).
  366. S. Mohades, A. M. Lietz and M. J. Kushner, "Generation of Reactive Species in Water Film Dielectric Barrier Discharges Sustained in Argon, Helium, Air, Oxygen and Nitrogen", J. Phys. D: Appl. Phys. 53, 435206 (2020).
  367. Y. Zhu, S. M. Starikovskaia, N. Yu. Babaeva and M. J. Kushner, "Scaling of Pulsed Nanosecond Capillary Plasmas at Different Specific Energy Deposition", Plasma Sources Sci. Technol. 29, 125006 (2020).
  368. G. Parsey, A. M. Lietz and M. J. Kushner, "Guided Plasma Jets Directed onto Wet Surfaces: Angular Dependence and Control", J. Phys. D: Appl. Phys. 54, 045206 (2021).
  369. J. Kruszelnicki, K. W. Engeling, J. E. Foster and M. J. Kushner, "Interactions between Atmospheric Pressure Plasmas and Metallic Catalyst Particles in Packed Bed Reactors", J. Phys. D: Appl. Phys. 54, 104001 (2021).
  370. W. Ning, J. Lai, J. Kruszelnicki, J. E. Foster, D. Dai and M. J. Kushner, "Propagation of Positive Discharges in an Air Bubble Having an Embedded Water Droplet", Plasma Sources Sci. Technol. 30, 015005 (2021).
  371. X. Wang, M. Wang, P. Biolsi and M. J. Kushner, "Scaling of Atomic Layer Etching of SiO2 in Fluorocarbon Plasmas: Transient Etching and Surface Roughness", J. Vac. Sci. Technol. A 39, 033003 (2021).
  372. J. Kruszelnicki, R. Ma and M. J. Kushner, "Propagation of Atmospheric Pressure Plasmas Through Interconnected Pores in Dielectric Materials", J. Appl. Phys. 129, 143302 (2021).
  373. X. Wang, H. Lee, S. K. Nam and M. J. Kushner, "Erosion of Focus Rings in Capacitively Coupled Plasma Etching Reactors", J. Vac. Sci. Technol. A 39, 063002 (2021).
  374. F. Krüger, H. Lee, S. K. Nam and M. J. Kushner, "Electric Field Reversals Resulting from Voltage Waveform Tailoring in Ar/O2 Capacitively Coupled Plasmas Sustained in Asymmetric Systems", Plasma Sources Sci. Technol. 30, 085002 (2021).
  375. C. Qu, Y. Sakiyama, P. Agarwal and M. J. Kushner, "Plasma-enhanced Atomic Layer Deposition of SiO2 Film Using Capacitively Coupled Ar/O2 Plasmas: A Computational Investigation", J. Vac. Sci. Technol. A 39, 052403 (2021).
  376. P. J. Bruggeman, R. R. Frontiera, U. R. Kortshagen, M. J. Kushner, S. Linic, G. C. Schatz, H. Andaraarachchi, S. Exarhos, L. O. Jones, C. M. Mueller, C. C. Rich, C. Xu, Y. Yue and Y. Zhang, "Plasma-driven Solution Electrolysis", J. Appl. Phys. 129, 200902 (2021). [Selected for cover of J. Appl. Phys. vol. 129, Issue 20, May 2021.]
  377. N. Chaubey, J. Goree, S. J. Lanham and M. J. Kushner, "Positive Charging of Grains in an Afterglow Plasma Is Enhanced by Ions Drifting in an Electric Field", Phys. Plasmas 28, 103702 (2021).
  378. S. J. Lanham, J. Polito, X. Shi, P. Elvati, A. Violi and M. J. Kushner, "Scaling of Silicon Nanoparticle Growth in Low Temperature Flowing Plasmas", J. Appl. Phys. 130, 163302 (2021). [Selected for cover of J. Appl. Phys. vol. 130, Issue 16, Oct. 2021.]
  379. Z. Xiong, S. Lanham, E. Husmann, G. Nelson, M. A. Eslamisaray, J. Polito, Y. Liu, J. Goree, E. Thimsen, M. J. Kushner and U. R. Kortshagen, "Particle Trapping, Size-filtering, and Focusing in the Nonthermal Plasma Synthesis of sub-10 Nanometer Particles", J. Phys. D: Appl. Phys. 55, 235202 (2022).
  380. J. Polito, M. Denning, R. Stewart, D. Frost and M. J. Kushner, "Atmospheric Pressure Plasma Functionalization of Polystyrene", J. Vac. Sci. Technol. A 40, 043001 (2022). [Selected as an Editor’s Pick for J. Vac. Sci. Technol. Vol 40, Issue 4, Jul. 2022.]
  381. I. Adamovich, S. Agarwal, E. Ahedo, L. L. Alves, S. Baalrud, N. Babaeva, A. Bogaerts, A. Bourdon, P. J. Bruggeman, C. Canal, E. H. Choi, S. Coulombe, Z. Donkó, D. B. Graves, S. Hamaguchi, D. Hegemann, M. Hori, H.-H. Kim, G. M. W. Kroesen, M. J. Kushner, A. Laricchiuta, X. Li, T. E. Magin, S. Mededovic Thagard, V. Miller, A. B. Murphy, G. S. Oehrlein, N. Puac, R. M. Sankaran, S. Samukawa, M. Shiratani, M. Šimek, N. Tarasenko, K. Terashima, E. Thomas Jr., J. Trieschmann, S. Tsikata, M. M. Turner, I. J. van der Walt, M. C. M. van de Sanden and T. von Woedtke, "The 2022 Plasma Roadmap: Low Temperature Plasma Science and Technology", J. Phys. D: Appl. Phys. 55, 373001 (2022).
  382. S. J. Lanham, J. Polito, Z. Xiong, U. R. Kortshagen and M. J. Kushner, "Pulsed Power to Control Growth of Silicon Nanoparticles in Low Temperature Flowing Plasmas", J. Appl. Phys. 132, 073301 (2022). [Featured as cover image for J. Appl. Phys. Vol 132, Issue 7, Aug. 2022.]
  383. M. Meyer, G. Nayak, P. J. Bruggeman and M. J. Kushner, "Sheath Formation around a Dielectric Droplet in a He Atmospheric Pressure Plasma", J. Appl. Phys. 132, 083303 (2022).
  384. N. Pillai, N. L. Sponsel, J. T. Mast, M. J. Kushner, I. A. Bolotnov and K. Stapelmann, "Plasma Breakdown in Bubbles Passing between Two Pin Electrodes", J. Phys. D: Appl. Phys. 55, 475203 (2022).
  385. Y. Du, F. Krüger, S. K. Nam, H. Lee, S. Yoo, J. Eapen, M. J. Kushner and S. Shannon, "Comparison of Glancing-angle Scatterings on Different Materials in a High Aspect Ratio Plasma Etching Process Using Molecular Dynamics Simulation", J. Vac. Sci. Technol. A 40, 053007 (2022).
  386. K. Konina, J. Kruszelnicki, M. E. Meyer and M. J. Kushner, "Surface Ionization Waves Propagating over Non-planar Substrates: Wavy Surfaces, Cut-pores and Droplets", Plasma Sources Sci. Technol. 31, 115001 (2022).
  387. A. L. Raisanen, C. M. Mueller, S. Chaudhuri, G. C. Schatz and M. J. Kushner, "A Reaction Mechanism for Plasma Electrolysis of AgNO3 Forming Silver Nanoclusters and Nanoparticles", J. Appl. Phys. 132, 203302 (2022).
  388. C. Xu, H. P. Andaraarachchi, Z. Xiong, M. A. Eslamisaray, M. J. Kushner and U. R. Kortshagen, "Size-tunable Silver Nanoparticle Synthesis in Glycerol Driven by a Low-pressure Nonthermal Plasma", J. Phys. D: Appl. Phys. 56, 015201 (2023).
  389. F. Krüger, H. Lee, S. K. Nam and M. J. Kushner, "Voltage Waveform Tailoring for High Aspect Ratio Plasma Etching of SiO2 Using Ar/CF4/O2 Mixtures: Consequences of Ion and Electron Distributions on Etch Profiles", J. Vac. Sci. Technol. A 41, 013006 (2023). [Selected as an Editor’s Choice.]
  390. E. Husmann, J. Polito, S. Lanham, M. J. Kushner, E. Thimsen, "Design Considerations for Controlling Silicon Nanoparticle Nucleation and Growth in a Nonthermal Plasma", Plasma Chemistry and Plasma Processing 43, 225–245 (2023).
  391. L. L. Alves, M. M. Becker, J. van Dijk, T. Gans, D. B. Go, K. Stapelmann, J. Tennyson, M. M. Turner and M. J. Kushner, "Foundations of Plasma Standards", Plasma Sources Sci. Technol. 32, 023001 (2023).
  392. G. Nayak, M. Meyer, G. Oinuma, M. J. Kushner and P. J. Bruggeman, "The Transport Dynamics of Tens of Micrometer-sized Water Droplets in RF Atmospheric Pressure Glow Discharges", Plasma Sources Sci. Technol. 32, 045005 (2023).
  393. T. Piskin, Y. Qian, P. Pribyl, W. Gekelman and M. J. Kushner, "E–H Transitions in Ar/O2 and Ar/Cl2 Inductively Coupled Plasmas: Antenna Geometry and Operating Conditions", J. Appl. Phys. 133, 173302 (2023). [Featured as cover image for J. Appl. Phys. Vol 133, Issue 17, May 2022.]
  394. M. Meyer, G. Nayak, P. J. Bruggeman and M. J. Kushner, "HCOO−aq Degradation in Droplets by OHaq in an Atmospheric Pressure Glow Discharge", J. Phys. D: Appl. Phys. 56, 285202 (2023).
  395. J. Polito, M. J. Herrera Quesada, K. Stapelmann and M. J. Kushner, "Reaction Mechanism for Atmospheric Pressure Plasma Treatment of Cysteine in Solution", J. Phys. D: Appl. Phys. 56, 395205 (2023).
  396. M. Meyer, J. Foster and M. J. Kushner, "A Surface Mechanism for O3 production with N2 Addition in Dielectric Barrier Discharges", Plasma Sources Sci. Technol. 32, 085001(2023).
  397. K. Konina, T. A. Freeman and M. J. Kushner, "Atmospheric Pressure Plasma Treatment of Skin: Penetration into Hair Follicles", Plasma Sources Sci. Technol. 32, 085020 (2023).
  398. K. Konina, S. Raskar, I. V. Adamovich and M. J. Kushner, "Atmospheric Pressure Plasmas Interacting with Wet and Dry Microchannels: Reverse Surface Ionization Waves", Plasma Sources Sci. Technol. 33, 015002 (2024).
  399. G. J. Smith, P. Diomede, A. R. Gibson, S. J. Doyle, V. Guerra, M. J. Kushner, T. Gans and J. P. Dedrick, "Low-pressure Inductively Coupled Plasmas in Hydrogen: Impact of Gas Heating on the Spatial Distribution of Atomic Hydrogen and Vibrationally Excited States", Plasma Sources Sci. Technol. 33, 025002 (2024).
  400. S. Raskar, I. V. Adamovich, K. Konina and M. J. Kushner, "Spatio-temporal Electric Field Distributions in an Atmospheric Plasma Jet Impinging on a Microchannel Array Surface", Plasma Sources Sci. Technol. 33, 025010 (2024).
  401. F. Krüger, H. Lee, S. K. Nam and M. J. Kushner, "Voltage Waveform Tailoring for High Aspect Ratio Plasma Etching of SiO2 using Ar/CF4/O2 Mixtures: Consequences of Low Fundamental Frequency Biases", Phys. Plasmas 31, 033508 (2024).
  402. M. Meyer, X. Huang, X. Fan and M. J. Kushner, "Managing Photon Flux in a Miniaturized Photoionization Detector", J. Appl. Phys. 135, 143301 (2024).
  403. M. Meyer, S. Kerketta, R. Hartman and M. J. Kushner, "CH3 Radical Generation in Microplasmas for Up-Conversion of Methane", J. Phys. Chem. A 128, 2656−2671 (2024).
  404. D. B. Graves, C. B. Labelle, M. J. Kushner, E. S. Aydil, V. M. Donnelly, J. P. Chang, P. Mayer, L. Overzet, S. Shannon, S. Rauf and D. N. Ruzic, "Science Challenges and Research Opportunities for Plasma Applications in Microelectronics", J. Vac. Sci. Technol. B 42, 042202 (2024).
  405. G. S. Oehrlein, S. M. Brandstadter, R. L. Bruce, Jane P. Chang, J. C. DeMott, V. M. Donnelly, R. Dussart, A. Fischer, R. A. Gottscho, S. Hamaguchi, M. Honda, M. Hori, K. Ishikawa, S. G. Jaloviar, K. J. Kanarik, K. Karahashi, A. Ko, H. Kothari, N. Kuboi, M. J. Kushner, T. Lill, P. Luan, A. Mesbah, E. Miller, S. Nath, Y. Ohya, M. Omura, C. Park, J. Poulose, S. Rauf, M. Sekine, T. G. Smith, N. Stafford, T. Standaert and P. L. G. Ventzek, "Future of plasma Etching for Mcroelectronics: Challenges and Opportunities", J. Vac. Sci. Technol. B 42, 041501 (2024).
  406. F. Krüger, D. Zhang, P. Luan, M. Park, A. Metz and M. J. Kushner, "Autonomous Hybrid Optimization of a SiO2 Plasma Etching Mechanism", J. Vac. Sci. Technol. A 42, 043008 (2024).